×
验证码:
换一张
忘记密码?
记住我
CORC
首页
科研机构
检索
知识图谱
申请加入
托管服务
登录
注册
在结果中检索
科研机构
长春光学精密机械与... [26]
上海光学精密机械研... [25]
近代物理研究所 [6]
上海应用物理研究所 [5]
中国科学院大学 [4]
西安光学精密机械研究... [3]
更多...
内容类型
期刊论文 [55]
学位论文 [17]
会议论文 [10]
专利 [3]
发表日期
2022 [1]
2021 [1]
2020 [2]
2019 [4]
2018 [4]
2017 [5]
更多...
学科主题
physics [1]
光学工程 [1]
半导体物理 [1]
×
知识图谱
CORC
开始提交
已提交作品
待认领作品
已认领作品
未提交全文
收藏管理
QQ客服
官方微博
反馈留言
浏览/检索结果:
共85条,第1-10条
帮助
已选(
0
)
清除
条数/页:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
排序方式:
请选择
作者升序
作者降序
题名升序
题名降序
发表日期升序
发表日期降序
提交时间升序
提交时间降序
Study on the characteristics of atomic hydrogen cleaning carbon contamination on multilayers
期刊论文
Vacuum, 2022, 卷号: 196, 页码: 11
作者:
Y. Song
;
Q. P. Lu
;
X. P. Gong
;
D. Z. Wang
;
Z. Zhang
收藏
  |  
浏览/下载:0/0
  |  
提交时间:2023/06/14
Design of off-axis multi-reflective optical system based on particle swarm optimization
期刊论文
Chinese Optics, 2021, 卷号: 14, 期号: 6, 页码: 1435-1450
作者:
Y. Wu
;
L.-P. Wang
;
J. Yu
;
X. Zhang and C.-S. Jin
收藏
  |  
浏览/下载:3/0
  |  
提交时间:2022/06/13
Research on Surface Roughness Related Coating Processes of Mo/Si Multilayers
期刊论文
Guangxue Xuebao/Acta Optica Sinica, 2020, 卷号: 40, 期号: 10, 页码: 7
作者:
S. Sun,C. Jin,B. Yu,T. Guo,S. Yao,C. Li and W. Deng
收藏
  |  
浏览/下载:2/0
  |  
提交时间:2021/07/06
Design method for off-axis aspheric reflective optical system with extremely low aberration and large field of view
期刊论文
Applied Optics, 2020, 卷号: 59, 期号: 32, 页码: 10185-10193
作者:
Y. Wu,L. P. Wang,J. Yu,B. Yu and C. S. Jin
收藏
  |  
浏览/下载:3/0
  |  
提交时间:2021/07/06
Nonuniform self-imaging of achromatic Talbot lithography
期刊论文
CHINESE OPTICS LETTERS, 2019, 卷号: 17, 期号: 6, 页码: -
作者:
Xia, HJ
;
Yang, SM
;
Wang, LS
;
Zhao, J
;
Xue, CF
收藏
  |  
浏览/下载:13/0
  |  
提交时间:2020/10/16
INTERFEROMETRIC LITHOGRAPHY
INTERFERENCE
Quality evaluation of solar magnetic field images at EUV wavelengths in digital image correlation method
期刊论文
Journal of Computational Methods in Sciences and Engineering, 2019, 卷号: 19, 期号: 4, 页码: 1109-1123
作者:
Y.Liu
;
K.-F.Song
;
J.-L.Ma
;
X.-D.Wang
;
Z.-W.Han
收藏
  |  
浏览/下载:0/0
  |  
提交时间:2020/08/24
Image quality,Displacement measurement,Extreme ultraviolet lithography,Image analysis,Magnetic fields,Quality control,Strain measurement
Modeling multilayer coating profiles with defects on EUV collector with grating
期刊论文
Optical Engineering, 2019, 卷号: 58, 期号: 10, 页码: 9
作者:
S.Z.Sun
;
C.S.Jin
;
B.Yu
;
T.Guo
;
S.Yao
收藏
  |  
浏览/下载:3/0
  |  
提交时间:2020/08/24
EUV collector with grating,multilayer coating profile,coating defects,deposition model,EUV reflectance,lithography,Optics
Theoretical determination of energies, wavelengths, and transition probabilities for EUV and SXR spectral lines in Rb XXXIV, Sr XXXV, Zr XXXVII, and Nb XXXVIII
期刊论文
Journal of Quantitative Spectroscopy & Radiative Transfer, 2019, 卷号: 225, 期号: 225, 页码: 76-83
作者:
Sang CC(桑萃萃)
收藏
  |  
浏览/下载:2/0
  |  
提交时间:2020/11/13
Atomic spectroscopy
Extreme ultraviolet lithography
Perturbation techniques
Electric quadrupoles
Level energies
Line identifications
Magnetic quadrupoles
National Institute of Standards and Technology
Relativistic many-body perturbation theories
Transition probabilities
Transition rates
Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography
期刊论文
MACROMOLECULAR MATERIALS AND ENGINEERING, 2018, 卷号: 303, 期号: 6
作者:
Peng, Xiaoman
;
Wang, Yafei
;
Xu, Jian
;
Yuan, Hua
;
Wang, Liangqian
收藏
  |  
浏览/下载:31/0
  |  
提交时间:2019/04/09
Euv
Lithography
Molecular Glasses
Photoresists
Design and fabrication of EUV broadband multilayer mirrors with discrete thicknesses
期刊论文
Guangxue Jingmi Gongcheng/Optics and Precision Engineering, 2018, 卷号: 26, 期号: 10, 页码: 2395-2406
作者:
Kuang, Shang-Qi
;
Li, Shuo
;
Yang, Hai-Gui
;
Huo, Tong-Lin
;
Zhou, Hong-Jun
收藏
  |  
浏览/下载:7/0
  |  
提交时间:2019/09/17
Multilayers
Extreme ultraviolet lithography
Fabrication
Mirrors
Reflection
©版权所有 ©2017 CSpace - Powered by
CSpace