Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography

doi:10.1002/mame.201700654

CORC > 化学研究所 > 中国科学院化学研究所

	Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography
	Peng, Xiaoman 1; Wang, Yafei 1; Xu, Jian 1; Yuan, Hua 1; Wang, Liangqian 1; Zhang, Tao 1; Guo, Xudong 1; Wang, Shuangqing 1; Li, Yi 2; Yang, Guoqiang 1
刊名	MACROMOLECULAR MATERIALS AND ENGINEERING
	2018-06-01
卷号	303 期号:6
关键词	Euv Lithography Molecular Glasses Photoresists
ISSN号	1438-7492
DOI	10.1002/mame.201700654
英文摘要	Novel molecular glasses (MGs) containing bisphenol A backbone (BPA-6 and BPA-10) are synthesized and characterized. BPA-6 and BAP-10 are excellent amorphous materials for extreme ultraviolet (EUV) patterning applications with good thermal stability (T-d more than 160 degrees C). The MGs can be used as positive-tone photoresists combined with triphenylsulfonium perfluoro-1-butanesulfonate and trioctylamine dissolved in propylene glycol monomethyl ether acetate. High-resolution feature sizes as small as 23.1 nm with extremely low line edge roughness (less than 2 nm), high sensitivity (less than 20 mJ cm(-2)), and good high aspect ratio patterns are obtained by using EUV lithography.
语种	英语
出版者	WILEY-V C H VERLAG GMBH
WOS记录号	WOS:000435279800006
内容类型	期刊论文
源URL	[http://ir.iccas.ac.cn/handle/121111/42625]
专题	中国科学院化学研究所
通讯作者	Wang, Shuangqing; Li, Yi; Yang, Guoqiang
作者单位	1.Univ Chinese Acad Sci, Chinese Acad Sci, Inst Chem, Beijing Natl Lab Mol Sci,Key Lab Photochem, Beijing 100190, Peoples R China 2.Univ Chinese Acad Sci, Chinese Acad Sci, Tech Inst Phys & Chem, Key Lab Photochem Convers & Optoelect Mat, Beijing 100190, Peoples R China
推荐引用方式 GB/T 7714	Peng, Xiaoman,Wang, Yafei,Xu, Jian,et al. Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography[J]. MACROMOLECULAR MATERIALS AND ENGINEERING,2018,303(6).
APA	Peng, Xiaoman.,Wang, Yafei.,Xu, Jian.,Yuan, Hua.,Wang, Liangqian.,...&Yang, Guoqiang.(2018).Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography.MACROMOLECULAR MATERIALS AND ENGINEERING,303(6).
MLA	Peng, Xiaoman,et al."Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography".MACROMOLECULAR MATERIALS AND ENGINEERING 303.6(2018).