Design method for off-axis aspheric reflective optical system with extremely low aberration and large field of view
Y. Wu,L. P. Wang,J. Yu,B. Yu and C. S. Jin
刊名Applied Optics
2020
卷号59期号:32页码:10185-10193
ISSN号1559-128X
DOI10.1364/ao.409561
英文摘要This paper proposes a grouping design method based on a combination of spatial ray tracing and aberration correction to construct the initial structure for an off-axis multi-reflective aspheric optical system. This method establishes a mathematical parameter model of the optical system to satisfy the aberration balance and multi-constraint control requirements. The simulated annealing particle swarm algorithm is applied to calculate the initial optical system structure. Finally, an extreme ultraviolet (EUV) lithography projection objective with six-reflective aspheric mirrors is used as an example to verify the reliability and effectiveness of this method. A 0.33 numerical aperture EUV lithographic objective with wavefront error better than 1/70 lambda(lambda = 13.5 nm) root mean square (RMS) is obtained. (C) 2020 Optical Society of America
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语种英语
内容类型期刊论文
源URL[http://ir.ciomp.ac.cn/handle/181722/64414]  
专题中国科学院长春光学精密机械与物理研究所
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Y. Wu,L. P. Wang,J. Yu,B. Yu and C. S. Jin. Design method for off-axis aspheric reflective optical system with extremely low aberration and large field of view[J]. Applied Optics,2020,59(32):10185-10193.
APA Y. Wu,L. P. Wang,J. Yu,B. Yu and C. S. Jin.(2020).Design method for off-axis aspheric reflective optical system with extremely low aberration and large field of view.Applied Optics,59(32),10185-10193.
MLA Y. Wu,L. P. Wang,J. Yu,B. Yu and C. S. Jin."Design method for off-axis aspheric reflective optical system with extremely low aberration and large field of view".Applied Optics 59.32(2020):10185-10193.
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