Nonuniform self-imaging of achromatic Talbot lithography

doi:10.3788/COL201917.062201

CORC > 上海应用物理研究所 > 中国科学院上海应用物理研究所 > 中科院上海应用物理研究所2011-2017年

	Nonuniform self-imaging of achromatic Talbot lithography
	Xia, HJ ; Yang, SM ; Wang, LS ; Zhao, J ; Xue, CF ; Wu, YQ ; Tai, RZ
刊名	CHINESE OPTICS LETTERS
	2019
卷号	17 期号:6 页码:-
关键词	INTERFEROMETRIC LITHOGRAPHY INTERFERENCE
ISSN号	1671-7694
DOI	10.3788/COL201917.062201
文献子类	期刊论文
英文摘要	Achromatic Talbot lithography (ATL) with high resolution has been demonstrated to be an excellent technique for large area periodic nano-fabrication. In this work, the uniformity of pattern distribution in ATL was studied in detail. Two ATL transmission masks with similar to 50% duty cycle in a square lattice were illuminated by a spatial coherent broadband extreme ultraviolet beam with a relative bandwidth of 2.38%. Nonuniform dot size distribution was observed by experiments and finite-difference time-domain simulations. The sum of the two kinds of diffraction patterns, with different lattice directions (45 degrees rotated) and different intensity distributions, results in the final nonuniform pattern distribution.
语种	英语
内容类型	期刊论文
源URL	[http://ir.sinap.ac.cn/handle/331007/32143]
专题	上海应用物理研究所_中科院上海应用物理研究所2011-2017年
作者单位	1.Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China; 2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China; 3.Shanghai Adv Res Inst, Shanghai Synchrotron Radiat Facil, Shanghai 201204, Peoples R China
推荐引用方式 GB/T 7714	Xia, HJ,Yang, SM,Wang, LS,et al. Nonuniform self-imaging of achromatic Talbot lithography[J]. CHINESE OPTICS LETTERS,2019,17(6):-.
APA	Xia, HJ.,Yang, SM.,Wang, LS.,Zhao, J.,Xue, CF.,...&Tai, RZ.(2019).Nonuniform self-imaging of achromatic Talbot lithography.CHINESE OPTICS LETTERS,17(6),-.
MLA	Xia, HJ,et al."Nonuniform self-imaging of achromatic Talbot lithography".CHINESE OPTICS LETTERS 17.6(2019):-.