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CORC

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Plasma treatment of polymethyl methacrylate to improve surface hydrophilicity and antifouling performance 期刊论文
POLYMER ENGINEERING AND SCIENCE, 2020
作者:  Sui, Siyuan;  Li, Lin;  Shen, Jie;  Ni, Guohua;  Xie, Hongbin
收藏  |  浏览/下载：27/0  |  提交时间：2020/12/28
Striations in dual-frequency capacitively coupled CF4 plasmas: the role of the high-frequency voltage amplitude 期刊论文
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2019, 卷号: 28
作者:  Liu, Yong-Xin;  Donko, Zoltan;  Korolov, Ihor;  Schungel, Edmund;  Wang, You-Nian
收藏  |  浏览/下载：10/0  |  提交时间：2019/12/02
Modification of polyacrylonitrile membranes via plasma treatment followed by polydimethylsiloxane coating for recovery of ethyl acetate from aqueous solution through vacuum membrane distillation 期刊论文
SEPARATION AND PURIFICATION TECHNOLOGY, 2018, 卷号: 197, 页码: 178-188
作者:  Wu, Huanhuan;  Shen, Fei;  Su, Yi;  Chen, Xiangrong;  Wan, Yinhua
收藏  |  浏览/下载：32/0  |  提交时间：2018/06/11
ALE of SiO2 by alternating CF4 plasma with energetic Ar+ plasma beams 会议论文
7th international conference on microelectronics and plasma technology
作者:  Dong W(董婉);  Dai ZL(戴忠玲);  Song YH(宋远红);  Wang YN(王友年)
收藏  |  浏览/下载：11/0  |  提交时间：2019/12/02
Electrical and spectral characterization of an atmospheric pressure He/CF4 plasma jet 期刊论文
PHYSICS OF PLASMAS, 2018, 卷号: 25
作者:  Chen, Sile;  Chen, Xingyu;  Yao, Congwei;  Xu, Guimin;  Chang, Zhengshi
收藏  |  浏览/下载：4/0  |  提交时间：2019/11/26
Accuracy control of SiO2 etching in inductively coupled CF4/Ar plasmas 会议论文
1st Asia-Pacific Conference on Plasma Physics, 18-23, 09.2017
作者:  Dai ZL(戴忠玲);  Wang YN(王友年)
收藏  |  浏览/下载：3/0  |  提交时间：2019/12/02
Space charge dynamics Of CF4 fluorinated LDPE samples from different fluorination conditions and their DC conductivities 期刊论文
MATERIALS RESEARCH EXPRESS, 2017, 卷号: 4
作者:  Liu, Ning;  Li, Ziyun;  Chen, George;  Chen, Qiang;  Li, Shengtao
收藏  |  浏览/下载：3/0  |  提交时间：2019/11/26
Surface modification of epoxy resin using He/CF4 atmospheric pressure plasma jet for flashover withstanding characteristics improvement in vacuum 期刊论文
APPLIED SURFACE SCIENCE, 2017, 卷号: 414, 页码: 107-113
作者:  Chen, Sile;  Wang, Shuai;  Wang, Yibo;  Guo, Baohong;  Li, Guoqiang
收藏  |  浏览/下载：4/0  |  提交时间：2019/11/26
Simulation of SiO2 etching in an inductively coupled CF4 plasma 期刊论文
MODERN PHYSICS LETTERS B, 2017, 卷号: 31, 页码: 1750042-1750042
作者:  Xu, Qing[1,2];  Li, Yu-Xing[1,2];  Li, Xiao-Ning[1,2];  Wang, Jia-Bin[1,2];  Yang, Fan[3]
收藏  |  浏览/下载：4/0  |  提交时间：2019/04/24
Surface etching mechanism of carbon-doped ge2sb2te5 phase change material in fluorocarbon plasma 期刊论文
Applied physics a-materials science & processing, 2016, 卷号: 122, 期号: 9, 页码: 6
作者:  Shen, Lanlan;  Song, Sannian;  Song, Zhitang;  Li, Le;  Guo, Tianqi
收藏  |  浏览/下载：31/0  |  提交时间：2019/05/09

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