| Striations in dual-frequency capacitively coupled CF4 plasmas: the role of the high-frequency voltage amplitude | |
| Liu, Yong-Xin; Donko, Zoltan; Korolov, Ihor; Schungel, Edmund; Wang, You-Nian; Schulze, Julian | |
| 刊名 | PLASMA SOURCES SCIENCE & TECHNOLOGY
 |
| 2019 | |
| 卷号 | 28 |
| 关键词 | striations electronegative plasma low pressure capacitively coupled RF discharge |
| ISSN号 | 0963-0252 |
| URL标识 | 查看原文 |
| WOS记录号 | [DB:DC_IDENTIFIER_WOSID] |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/3229938 |
| 专题 | 大连理工大学 |
| 作者单位 | 1.Dalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China. 2.Hungarian Acad Sci, Inst Solid State Phys & Opt, Wigner Res Ctr Phys, Konkoly Thege Miklos Str 29-33, H-1121 Budapest, Hungary. 3.Ruhr Univ Bochum, Inst Elect Engn, D-44801 Bochum, Germany. 4.Evatec AG, Trubbach, Switzerland. 5.Ruhr Univ Bochum, Inst Elect Engn, D-44801 Bochum, Germany. 6.West Virginia Univ, Dept Phys, Morgantown, WV 26506 USA. |
| 推荐引用方式 GB/T 7714 | Liu, Yong-Xin,Donko, Zoltan,Korolov, Ihor,et al. Striations in dual-frequency capacitively coupled CF4 plasmas: the role of the high-frequency voltage amplitude[J]. PLASMA SOURCES SCIENCE & TECHNOLOGY,2019,28. |
| APA | Liu, Yong-Xin,Donko, Zoltan,Korolov, Ihor,Schungel, Edmund,Wang, You-Nian,&Schulze, Julian.(2019).Striations in dual-frequency capacitively coupled CF4 plasmas: the role of the high-frequency voltage amplitude.PLASMA SOURCES SCIENCE & TECHNOLOGY,28. |
| MLA | Liu, Yong-Xin,et al."Striations in dual-frequency capacitively coupled CF4 plasmas: the role of the high-frequency voltage amplitude".PLASMA SOURCES SCIENCE & TECHNOLOGY 28(2019). |
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