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| Breaking Through 1-D Layout Limitations and Regaining 2-D Design Freedom Part I: 2-D Layout Decomposition and Stitching Techniques for Hybrid (CPCI-S收录) 会议
作者: Liu, Hongyi[1]; Zhou, Jun[1]; Chen, Yijian[1]
  收藏 | 浏览/下载：10/0 | 提交时间：2019/04/11
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| Benchmarking Process Integration and Layout Decomposition of Directed Self-Assembly and Self-Aligned Multiple Patterning Techniques (CPCI-S收录) 会议论文
DESIGN-PROCESS-TECHNOLOGY CO-OPTIMIZATION FOR MANUFACTURABILITY VIII
作者: Chen, Yijian[1]; Zhou, Jun[1]; You, Jun[1]; Liu, Hongyi[1]
收藏 | 浏览/下载：3/0 | 提交时间：2019/04/12
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| A Layout Decomposition Algorithm for Self-Aligned Multiple Patterning (CPCI-S收录) 会议论文
DESIGN-PROCESS-TECHNOLOGY CO-OPTIMIZATION FOR MANUFACTURABILITY VIII
作者: You, Jun[1]; Liu, Hongyi[1]; Chen, Yijian[1]
收藏 | 浏览/下载：11/0 | 提交时间：2019/04/12
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| Intra-Cell Process Variability and Compact Modeling of LWR Effects: from Self-Aligned Multiple Patterning to Multiple-Gate MOSFETs (CPCI-S收录) 会议论文
DESIGN FOR MANUFACTURABILITY THROUGH DESIGN-PROCESS INTEGRATION VI
作者: Chen, Yijian[1]; Kang, Weiling[1]; Cheng, Qi[1]
收藏 | 浏览/下载：3/0 | 提交时间：2019/04/15
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| Cut-Process Overlay Yield Model for Self-aligned Multiple Patterning and a Misalignment Correction Technique Based on Dry Etching (CPCI-S收录) 会议论文
ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING II
作者: Zhang, Pan[1]; Chen, Yijian[1]
收藏 | 浏览/下载：1/0 | 提交时间：2019/04/15
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| Technological Merits, Process Complexity, and Cost Analysis of Self-aligned Multiple Patterning (CPCI-S收录) 会议论文
OPTICAL MICROLITHOGRAPHY XXV, PTS 1AND 2
作者: Chen, Yijian[1]; Cheng, Qi[1]; Kang, Weiling[1]
收藏 | 浏览/下载：11/0 | 提交时间：2019/04/15
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