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浏览/检索结果: 共30条，第1-10条 帮助 已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 Socio-demographic drivers and public perceptions of consumption and conservation of Asian horseshoe crabs in northern Beibu Gulf, China 期刊论文 AQUATIC CONSERVATION-MARINE AND FRESHWATER ECOSYSTEMS, 2019, 卷号: 29, 期号: 8, 页码: 1268-1277 作者:  Fu, Yijian[1];  Huang, Shuyan[2];  Wu, Zhou[3];  Wang, Chun-Chieh[4];  Su, Meidan[5] 收藏  |  浏览/下载：35/0  |  提交时间：2020/01/02 disturbance  estuary  intertidal  invertebrates  overfishing  public perception   Author's Reply to "Comments on 'A General and Transformable Model Platform for Emerging Multi-Gate MOSFETs'" 期刊论文 IEEE ELECTRON DEVICE LETTERS, 2017, 卷号: 38, 页码: 1619-1620 作者:  Hong, Chuyang[1];  Zhou, Jun[1];  Wang, Rui[1];  Huang, Jiasheng[1];  Bai, Wenlong[1] 收藏  |  浏览/下载：6/0  |  提交时间：2019/04/24 Statistical Modeling of SRAM Yield Performance and Circuit Variability (CPCI-S收录) 会议 作者:  Cheng, Qi[1];  Chen, Yijian[1] 收藏  |  浏览/下载：6/0  |  提交时间：2019/04/11 SRAM  SASP  SAQP  circuit variability  statistical modeling  yield   Random 2-D layout decomposition and synthesis using self-aligned multiple patterning and stitching techniques (CPCI-S收录) 会议 作者:  Liu, Hongyi[1];  Zhou, Jun[1];  Chen, Yijian[1] 收藏  |  浏览/下载：2/0  |  提交时间：2019/04/11 Self-aligned multiple patterning  Layout decomposition and synthesis  Stitching   Breaking Through 1-D Layout Limitations and Regaining 2-D Design Freedom Part II: Stitching Yield Modeling and Optimization (CPCI-S收录) 会议 作者:  Zhou, Jun[1];  Liu, Hongyi[1];  Han, Ting[1];  Chen, Yijian[1] 收藏  |  浏览/下载：3/0  |  提交时间：2019/04/11 stitching yield  overlay error  cut hole  overhang  probability of success (POS)   A Compact Model to Predict Pillar-Edge-Roughness Effects on 3D Vertical Nanowire MOSFETs Using the Perturbation Method (CPCI-S收录) 会议 作者:  Wang, Pu[1];  Hong, Chuyang[1];  Cheng, Qi[1];  Chen, Yijian[1] 收藏  |  浏览/下载：4/0  |  提交时间：2019/04/11 3D vertical nanowire MOSFETs  pillar-edge roughness (PER)  Poisson's equation  Laplace equation  perturbation method   A Paradigm Shift in Patterning Foundation from Frequency Multiplication to Edge-Placement Accuracy - A Novel Processing Solution by Selective (CPCI-S收录) 会议 作者:  Han, Ting[1];  Liu, Hongyi[1];  Chen, Yijian[1] 收藏  |  浏览/下载：19/0  |  提交时间：2019/04/11 edge-placement errors (EPE)  alternating-material (dual-material) self-aligned multiple patterning (altSAMP)  alternating-material (dual-material) self-aligned quadruple/sextuple patterning (altSAQP/altSASP)  selective etching  cut-hole layout decomposition  probability of failure (POF)   Layout Decomposition and Synthesis for a Modular Technology to Solve the Edge-Placement Challenges by Combining Selective Etching, Direct Sti (CPCI-S收录) 会议 作者:  Liu, Hongyi[1];  Han, Ting[1];  Zhou, Jun[1];  Chen, Yijian[1] 收藏  |  浏览/下载：12/0  |  提交时间：2019/04/11 edge-placement errors (EPE)  selective etching  alternating-material (dual-material) self-aligned multiple patterning (altSAMP)  alternating-material (dual-material) self-aligned quadruple/sextuple patterning (altSAQP/altSASP)  direct stitching  layout decomposition and synthesis   A Comparative Study on the Yield Performance of Via Landing and Direct Stitching Processes for 2-D Pattern Connection (CPCI-S收录) 会议 作者:  Zhou, Jun[1];  Chen, Yijian[1] 收藏  |  浏览/下载：3/0  |  提交时间：2019/04/11 via landing  direct stitching  edge-placement errors (EPE)  probability of success (POS)   Cut-hole layout decomposition and synthesis to reduce the effect of edge-placement errors (CPCI-S收录) 会议 作者:  Liu, Hongyi[1];  Han, Ting[1];  Chen, Yijian[1] 收藏  |  浏览/下载：8/0  |  提交时间：2019/04/11 Edge-placement errors  Selective etching  Alternating-material self-aligned multiple patterning  Layout decomposition and synthesis