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A RF plasma source with focused magnetic field for material treatment 期刊论文
PLASMA CHEMISTRY AND PLASMA PROCESSING, 2022
作者:  Zhang, L. P.;  Chang, L.;  Yuan, X. G.;  Zhang, J. H.;  Zhou, H. S.
收藏  |  浏览/下载:17/0  |  提交时间:2022/12/23
The application of a helicon plasma source in reactive sputter deposition of tungsten nitride thin films 期刊论文
Plasma Science and Technology, 2022, 卷号: 24
作者:  YANG,Yan;  JI,Peiyu;  LI,Maoyang;  YU,Yaowei;  HUANG,Jianjun
收藏  |  浏览/下载:9/0  |  提交时间:2022/12/22


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