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Striations in dual-frequency capacitively coupled CF4 plasmas: the role of the high-frequency voltage amplitude 期刊论文
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2019, 卷号: 28
作者:  Liu, Yong-Xin;  Donko, Zoltan;  Korolov, Ihor;  Schungel, Edmund;  Wang, You-Nian
收藏  |  浏览/下载:10/0  |  提交时间:2019/12/02
Study on Effect of Neutral Gas Pressure on Plasma Characteristics in Capacitive RF Argon Glow Discharges at Low Pressure by Fluid Modeling 期刊论文
IEEE TRANSACTIONS ON PLASMA SCIENCE, 2018, 卷号: 46, 页码: 1738-1746
作者:  Samir, Tagra;  Liu, Yue;  Zhao, Lulu
收藏  |  浏览/下载:9/0  |  提交时间:2019/12/02
Hybrid Modeling of SiH4/Ar Discharge in a Pulse Modulated RF Capacitively Coupled Plasma 会议论文
68th Gaseous Electronics Conference
作者:  Song YH(宋远红);  Wang YN(王友年)
收藏  |  浏览/下载:3/0  |  提交时间:2019/12/09
Numerical simulations of electrical asymmetry effect on electronegative plasmas in capacitively coupled rf discharge 期刊论文
JOURNAL OF APPLIED PHYSICS, 2011, 卷号: 109
作者:  Zhang, Quan-Zhi;  Jiang, Wei;  Hou, Lu-Jing;  Wang, You-Nian
收藏  |  浏览/下载:2/0  |  提交时间:2019/12/18
Deposition of SiOx films with a capacitively-coupled plasma at atmospheric pressure 外文期刊
2007
作者:  Xu, XY;  Li, L;  Wang, SG;  Zhao, LL;  Ye, TC
收藏  |  浏览/下载:7/0  |  提交时间:2010/11/26
柱形等离子体辐射场的数值计算和分析 期刊论文
空间科学学报, 2005, 卷号: 25, 期号: 2, 页码: 93-98
赵国伟; 陈诚; 徐跃民
收藏  |  浏览/下载:18/0  |  提交时间:2014/04/30
Influence of gas pressure on the pattern evolutions of dust clusters and fractals in a dusty plasma system 期刊论文
CHINESE PHYSICS, 2004, 卷号: 13, 期号: 11, 页码: 1896
Huang, F; Ye, MF; Wang, L; Jiang, N
收藏  |  浏览/下载:18/0  |  提交时间:2013/09/17


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