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Ion-Implanted TiN Metal Gate With Dual Band-Edge Work Function and Excellent Reliability for Advanced CMOS Device Applications 期刊论文
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2015
作者:  Zhu HL(朱慧珑);  Liang QQ(梁擎擎);  Liu JB(刘金彪);  Li JF(李俊峰);  Xiang JJ(项金娟)
收藏  |  浏览/下载:11/0  |  提交时间:2016/05/31
Investigation of TiAlC by Atomic Layer Deposition as N Type 期刊论文
ECS Journal of Solid State Science and Technology, 2015
作者:  Cui HS(崔虎山);  Xiang JJ(项金娟);  Li TT(李亭亭);  Zhang YB(张严波);  Wang XL(王晓磊)
收藏  |  浏览/下载:18/0  |  提交时间:2016/05/31
A straightforward and CMOS-compatible nanofabrication technique of periodic SiO2 nanohole arrays 期刊论文
Nanotechnology, 2015
作者:  Wei YY(韦亚一);  Meng LK(孟令款);  He XB(贺晓彬);  Gao JF(高建峰);  Li JJ(李俊杰)
收藏  |  浏览/下载:10/0  |  提交时间:2016/05/31
CMOS-Compatible Top-Down Fabrication of Periodic SiO2 Nanostructures using a Single Mask 期刊论文
Nanoscale Research Letters, 2015
作者:  Yan J(闫江);  Meng LK(孟令款);  Gao JF(高建峰);  He XB(贺晓彬);  Li JJ(李俊杰)
收藏  |  浏览/下载:5/0  |  提交时间:2016/05/31
Impact of pattern dependency of SiGe layers grown selectively in source/drain on the performance of 22nm node pMOSFETs 期刊论文
Solid-State Electronics, 2015
作者:  Li JF(李俊峰);  Wang GL(王桂磊);  Xu YF(徐烨峰);  Luo J(罗军);  Guo YL(郭奕栾)
收藏  |  浏览/下载:13/0  |  提交时间:2016/05/31
Atomic Layer Deposited TiAlC Film as Metal Gate for 22 nm Node CMOS Technology and Beyond 期刊论文
ALD 2015, 2015
作者:  Xiang JJ(项金娟);  Zhang YB(张严波);  Gao JF(高建峰);  Li TT(李亭亭);  Yin HX(殷华湘)
收藏  |  浏览/下载:14/0  |  提交时间:2016/05/31
Investigation of TaN as the wet etch stop layer for HKMG-last integration in the 22 nm and beyond nodes CMOS technology 期刊论文
Vacuum, 2015
作者:  Cui HS(崔虎山);  Luo J(罗军);  Xu J(许静);  Gao JF(高建峰);  Xiang JJ(项金娟)
收藏  |  浏览/下载:20/0  |  提交时间:2016/05/31
Improved Short Channel Effect Control in Bulk FinFETs With Vertical Implantation to Form Self-Aligned Halo and Punch-Through Stop Pocket 期刊论文
IEEE ELECTRON DEVICE LETTERS, 2015
作者:  Chen DP(陈大鹏);  Ye TC(叶甜春);  Zhu HL(朱慧珑);  Yin HX(殷华湘);  Xu M(许淼)
收藏  |  浏览/下载:10/0  |  提交时间:2016/05/31
Device parameter optimization for sub-20 nm node HK/MG-last bulk FinFETs 期刊论文
Journal of Semiconductors, 2015
作者:  Zhao ZG(赵治国);  Luo J(罗军);  Yang H(杨红);  Meng LK(孟令款);  Hong PZ(洪培真)
收藏  |  浏览/下载:33/0  |  提交时间:2016/05/31
Planar Bulk MOSFETs With Self-Aligned Pocket Well to Improve Short-Channel Effects and Enhance Device Performance 期刊论文
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2015
作者:  Zhao YY(赵玉印);  He XB(贺晓彬);  Gao JF(高建峰);  Xu Q(徐强);  Li JJ(李俊杰)
收藏  |  浏览/下载:17/0  |  提交时间:2016/05/31


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