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Striations in dual-frequency capacitively coupled CF4 plasmas: the role of the high-frequency voltage amplitude 期刊论文
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2019, 卷号: 28
作者:  Liu, Yong-Xin;  Donko, Zoltan;  Korolov, Ihor;  Schungel, Edmund;  Wang, You-Nian
收藏  |  浏览/下载:10/0  |  提交时间:2019/12/02
ALE of SiO2 by alternating CF4 plasma with energetic Ar+ plasma beams 会议论文
7th international conference on microelectronics and plasma technology
作者:  Dong W(董婉);  Dai ZL(戴忠玲);  Song YH(宋远红);  Wang YN(王友年)
收藏  |  浏览/下载:11/0  |  提交时间:2019/12/02
Accuracy control of SiO2 etching in inductively coupled CF4/Ar plasmas 会议论文
1st Asia-Pacific Conference on Plasma Physics, 18-23, 09.2017
作者:  Dai ZL(戴忠玲);  Wang YN(王友年)
收藏  |  浏览/下载:3/0  |  提交时间:2019/12/02
Modeling and experimental investigation of the plasma uniformity in CF4/O-2 capacitively coupled plasmas, operating in single frequency and dual frequency regime 期刊论文
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2015, 卷号: 33, 页码: -
作者:  Zhang, Yu-Ru;  Tinck, Stefan;  De Schepper, Peter;  Wang, You-Nian;  Bogaerts, Annemie
收藏  |  浏览/下载:1/0  |  提交时间:2019/12/09
Modeling and experimental investigation of the plasma uniformity in CF4/O2 期刊论文
J. Vac. Sci. Technol. A, 2015, 卷号: 33
作者:  Zhang YR(张钰如);  Wang YN(王友年)
收藏  |  浏览/下载:3/0  |  提交时间:2019/12/09
Heating mode transition in capacitively coupled CF4 discharges: comparison of experiments with simulations 期刊论文
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2015, 卷号: 24, 页码: -
作者:  Liu, Gang-Hu;  Liu, Yong-Xin;  Wen, De-Qi;  Wang, You-Nian
收藏  |  浏览/下载:2/0  |  提交时间:2019/12/09
Absolute CF2 density and gas temperature measurements by absorption spectroscopy in dual-frequency capacitively coupled CF4/Ar plasmas 期刊论文
PHYSICS OF PLASMAS, 2014, 卷号: 21
作者:  Liu, Wen-Yao;  Xu, Yong;  Liu, Yong-Xin;  Peng, Fei;  Gong, Fa-Ping
收藏  |  浏览/下载:2/0  |  提交时间:2019/12/09
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma 期刊论文
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2013, 卷号: 22, 页码: -
作者:  Zhao, Shu-Xia;  Gao, Fei;  Wang, You-Nian;  Bogaerts, Annemie
收藏  |  浏览/下载:4/0  |  提交时间:2019/12/11
Mode transition in CF4 + Ar inductively coupled plasma 期刊论文
PHYSICS OF PLASMAS, 2013, 卷号: 20
作者:  Liu, Wei;  Gao, Fei;  Zhao, Shu-Xia;  Li, Xue-Chun;  Wang, You-Nian
收藏  |  浏览/下载:3/0  |  提交时间:2019/12/11
Determination of Plasma Parameters in a Dual-Frequency Capacitively Coupled CF4 Plasma Using Optical Emission Spectroscopy 期刊论文
PLASMA SCIENCE & TECHNOLOGY, 2013, 卷号: 15, 页码: 885-890
作者:  Liu Wenyao;  Zhu Aimin;  Li Xiaosong;  Zhao Guoli;  Lu Wenqi
收藏  |  浏览/下载:5/0  |  提交时间:2019/12/11


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