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科研机构
半导体研究所 [12]
内容类型
期刊论文 [12]
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2011 [2]
2009 [1]
2008 [2]
2006 [2]
2004 [1]
2003 [2]
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半导体材料 [12]
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内容类型:期刊论文
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Investigation of cracks in GaN films grown by combined hydride and metal organic vapor-phase epitaxial method
期刊论文
nanoscale research letters, 2011, 卷号: 6, 页码: article no.69
作者:
Song HP
;
Wei HY
;
Li CM
;
Jiao CM
收藏
  |  
浏览/下载:66/4
  |  
提交时间:2011/07/05
CATHODOLUMINESCENCE CHARACTERIZATION
GALLIUM NITRIDE
STRESSES
LAYERS
HETEROSTRUCTURE
DEPOSITION
CONSTANTS
MECHANISM
SAPPHIRE
STRAIN
Influence of thermal stress on the characteristic parameters of AlGaN/GaN heterostructure Schottky contacts
期刊论文
chinese physics b, 2011, 卷号: 20, 期号: 4, 页码: article no.47105
Lu YJ
;
Lin ZJ
;
Zhang Y
;
Meng LG
;
Cao ZF
;
Luan CB
;
Chen H
;
Wang ZG
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  |  
浏览/下载:58/2
  |  
提交时间:2011/07/05
AlGaN/GaN heterostructures
thermal stressing
polarization
self-consistently solving Schrodinger's and Poisson's equations
FIELD-EFFECT TRANSISTORS
POLARIZATION
STABILITY
CHARGE
GAN
Bulge testing and fracture properties of plasma-enhanced chemical vapor deposited silicon nitride thin films
期刊论文
thin solid films, 2009, 卷号: 517, 期号: 6, 页码: 1989-1994
作者:
Li Y
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  |  
浏览/下载:360/38
  |  
提交时间:2010/03/08
Bulge test
Fracture property
Silicon nitride
Weibull distribution function
Fracture Properties of LPCVD Silicon Nitride and Thermally Grown Silicon Oxide Thin Films From the Load-Deflection of Long Si3N4 and SiO2/Si3N4 Diaphragms
期刊论文
journal of microelectromechanical systems, 2008, 卷号: 17, 期号: 5, 页码: 1120-1134
Yang, JL
;
Gaspar, J
;
Paul, O
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  |  
浏览/下载:27/0
  |  
提交时间:2010/03/08
Bulge test
fracture
pooled Weibull analysis
silicon nitride (Si3N4)
silicon oxide (SiO2)
Fracture properties of silicon carbide thin films by bulge test of long rectangular membrane
期刊论文
journal of microelectromechanical systems, 2008, 卷号: 17, 期号: 2, 页码: 453-461
Zhou, W
;
Yang, JL
;
Sun, GS
;
Liu, XF
;
Yang, FH
;
Li, JM
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  |  
浏览/下载:49/0
  |  
提交时间:2010/03/08
bulge test
fracture property
microelectromechanical systems (MEMS)
silicon carbide (SiC) thin films
Weibull distribution function
Finite element analysis of stress and strain distributions in InAs/GaAs quantum dots
期刊论文
chinese physics, 2006, 卷号: 15, 期号: 6, 页码: 1315-1319
Zhou WM
;
Wang CY
;
Chen YH
;
Wang ZG
收藏
  |  
浏览/下载:47/0
  |  
提交时间:2010/04/11
quantum dots
strain and stress distribution
strain energy
finite element method
ISLANDS
GROWTH
GAAS
GAAS(001)
EVOLUTION
Influence of dislocation stress field on distribution of quantum dots
期刊论文
physica e-low-dimensional systems & nanostructures, 2006, 卷号: 33, 期号: 1, 页码: 130-133
作者:
Xu B
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  |  
浏览/下载:55/0
  |  
提交时间:2010/04/11
stress
surface structure
semiconducting III-V materials
MOLECULAR-BEAM EPITAXY
STRAIN
THICKNESS
Depth distribution of the strain in the GaN layer with low-temperature AlN interlayer on Si(111) substrate studied by Rutherford backscattering/channeling
期刊论文
applied physics letters, 2004, 卷号: 85, 期号: 23, 页码: 5562-5564
Lu, Y
;
Cong, GW
;
Liu, XL
;
Lu, DC
;
Wang, ZG
;
Wu, MF
收藏
  |  
浏览/下载:21/0
  |  
提交时间:2010/03/17
STRESS
Structure characteristics of InGaN quantum dots fabricated by passivation and low temperature method
期刊论文
journal of crystal growth, 2003, 卷号: 252, 期号: 1-3, 页码: 19-25
Qu BZ
;
Chen Z
;
Lu DC
;
Han P
;
Liu XG
;
Wang XH
;
Wang D
;
Zhu QS
;
Wang ZG
收藏
  |  
浏览/下载:37/0
  |  
提交时间:2010/08/12
nanostructures
metalorganic chemical vapor deposition
nitrides
CHEMICAL-VAPOR-DEPOSITION
MOLECULAR-BEAM EPITAXY
SIZE DISTRIBUTION
GROWTH
GAAS
DEPENDENCE
EMISSION
NUMBER
Influence of high-temperature AIN buffer thickness on the properties of GaN grown on Si(111)
期刊论文
journal of crystal growth, 2003, 卷号: 258, 期号: 1-2, 页码: 34-40
作者:
Zhao DG
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  |  
浏览/下载:299/12
  |  
提交时间:2010/08/12
metalorganic chemical vapor deposition
nitrides
semiconductor III-V materials
MOLECULAR-BEAM EPITAXY
HIGH-QUALITY GAN
CHEMICAL-VAPOR-DEPOSITION
INTERMEDIATE LAYER
ALAS
ALN
SURFACES
SILICON
FILMS
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