CORC

浏览/检索结果: 共3条,第1-3条 帮助

限定条件    
已选(0)清除 条数/页:   排序方式:
Comprehensive understanding of the effect of electric dipole at high-k/SiO2 interface on the flatband voltage shift in metal-oxide-semiconductor device 外文期刊
2010
作者:  Han, K;  Wang, WW;  Ma, XL;  Chen, DP;  Zhang, J
收藏  |  浏览/下载:21/0  |  提交时间:2010/11/26
Effect of Al-diffusion-induced positive flatband voltage shift on the electrical characteristics of Al-incorporated high-k metal-oxide-semiconductor field-effective transistor 外文期刊
2009
作者:  Toriumi, A;  Ota, H;  Nabatame, T;  Mizubayashi, W;  Akiyama, K
收藏  |  浏览/下载:14/0  |  提交时间:2010/11/26
Role of interface dipole in metal gate/high-k effective work function modulation by aluminum incorporation 外文期刊
2009
作者:  Yan, L;  Zhang, XW;  Xiao, ZS;  Chu, PK;  Wang, WW
收藏  |  浏览/下载:6/0  |  提交时间:2010/11/26


©版权所有 ©2017 CSpace - Powered by CSpace