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Effect of implantation of nitrogen into SIMOX buried oxide on its fixed positive charge density 期刊论文
acta physica sinica, 2007, 卷号: 56, 期号: 9, 页码: 5446-5451
Zheng, ZS (Zheng Zhong-Shan); Zhang, EX (Zhang En-Xia); Liu, ZL (Liu Zhong-Li); Zhang, ZX (Zhang Zheng-Xuan); Li, N (Li Ning); Li, GH (Li Guo-Hua)
收藏  |  浏览/下载:34/0  |  提交时间:2010/03/29
SIMOX  
Effect of the technology of implanting nitrogen into buried oxide on the radiation hardness of the top gate oxide for partially depleted SOIPMOSFET 期刊论文
chinese physics, 2005, 卷号: 14, 期号: 3, 页码: 565-570
Zheng ZS; Liu ZL; Zhang GQ; Li N; Fan K; Zhang EX; Yi WB; Chen M; Wang X
收藏  |  浏览/下载:24/0  |  提交时间:2010/03/17
Effects of techniques of implanting nitrogen into buried oxide on the characteristics of partially depleted SOIPMOSFET 期刊论文
chinese physics letters, 2005, 卷号: 22, 期号: 3, 页码: 654-656
Zheng ZS; Liu ZL; Zhang GQ; Li N; Fan K; Zhang EX; Yi WB; Chen M; Wang X
收藏  |  浏览/下载:108/0  |  提交时间:2010/03/17
Effects of the technology of implanting nitrogen into buried oxide layer on the characteristics of partially depleted SOI nMOSFET 期刊论文
acta physica sinica, 2005, 卷号: 54, 期号: 1, 页码: 348-353
Zheng ZS; Liu ZL; Zhang GQ; Li N; Fan K; Zhang EX; Yi WB; Chen M; Wang X
收藏  |  浏览/下载:33/0  |  提交时间:2010/03/17
SOI  
Improvement of the radiation hardness of SIMOX buried layers using nitrogen implantation 期刊论文
semiconductor science and technology, 2005, 卷号: 20, 期号: 6, 页码: 481-484
Zheng ZS; Liu ZL; Zhang GQ; Li N; Li GH; Ma HZ; Zhang EX; Zhang ZX; Wang X
收藏  |  浏览/下载:32/5  |  提交时间:2010/03/17
OXIDES  
Radiation hardness improvement of separation-by-implantation-of-oxygen/silicon-on-insulator material by nitrogen ion implantation 期刊论文
journal of electronic materials, 2005, 卷号: 34, 期号: 11, 页码: l53-l56
Zhang EX; Sun JY; Chen J; Zhang ZX; Wang X; Li N; Zhang GQ; Liu ZL
收藏  |  浏览/下载:193/29  |  提交时间:2010/03/17
Silicon-on-insulating multi-layers for total-dose irradiation hardness 期刊论文
chinese physics letters, 2004, 卷号: 21, 期号: 8, 页码: 1600-1603
Zhang EX; Yi WB; Liu XH; Chen M; Liu ZL; Xi W
收藏  |  浏览/下载:379/54  |  提交时间:2010/03/09
Formation of total-dose-radiation hardened materials by sequential oxygen and nitrogen implantation and multi-step annealing 期刊论文
semiconductor science and technology, 2004, 卷号: 19, 期号: 5, 页码: 571-573
Yi WB; Zhang EX; Chen M; Li N; Zhang GQ; Liu ZL; Wang X
收藏  |  浏览/下载:179/57  |  提交时间:2010/03/09
LAYERS  


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