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浏览/检索结果: 共1条，第1-1条 帮助 限定条件 发表日期：2006     已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择发表日期升序发表日期降序提交时间升序提交时间降序题名升序题名降序作者升序作者降序 Low threshold field electron emission of diamond films (EI CONFERENCE) 会议论文 ICO20: Display Devices and Systems, August 21, 2005 - August 26, 2005, Changchun, China Liu L.; Xia Y.; Chen S.; Lei D.; Zhao H.; Liang J.; Li M.; Wang W.; Gu C.; Ji H. 收藏  |  浏览/下载：18/0  |  提交时间：2013/03/25 Since CVD diamond film possesses desirable properties  it has been widely investigated  and much research has been made in this field. In this experiment  we mainly studied the characteristics of field emission from the CVD diamond films. The motivation for the experiment is to gain some insight into a possible emission mechanism. The diamond films are grown using a hot filament chemical vapor deposition  basing on the diamond micro-grits on silicon substrates. And the diamond micro-grits are deposited on silicon substrates using electrophoresis coat method  through a solution of diamond micro-grits in ethyl alcohol. This study has revealed that emission can be obtained at fields as low as 1.8V/m. And the field emission measurements were carried out at a pressure of 10-4Pa.