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	Low threshold field electron emission of diamond films (EI CONFERENCE)
	Liu L. ; Xia Y. ; Chen S. ; Lei D. ; Zhao H. ; Liang J. ; Li M. ; Wang W. ; Gu C. ; Ji H.
	2006
会议名称	ICO20: Display Devices and Systems, August 21, 2005 - August 26, 2005
会议地点	Changchun, China
关键词	Since CVD diamond film possesses desirable properties it has been widely investigated and much research has been made in this field. In this experiment we mainly studied the characteristics of field emission from the CVD diamond films. The motivation for the experiment is to gain some insight into a possible emission mechanism. The diamond films are grown using a hot filament chemical vapor deposition basing on the diamond micro-grits on silicon substrates. And the diamond micro-grits are deposited on silicon substrates using electrophoresis coat method through a solution of diamond micro-grits in ethyl alcohol. This study has revealed that emission can be obtained at fields as low as 1.8V/m. And the field emission measurements were carried out at a pressure of 10-4Pa.
收录类别	EI
内容类型	会议论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/33645]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式 GB/T 7714	Liu L.,Xia Y.,Chen S.,et al. Low threshold field electron emission of diamond films (EI CONFERENCE)[C]. 见:ICO20: Display Devices and Systems, August 21, 2005 - August 26, 2005. Changchun, China.

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