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浏览/检索结果: 共4条，第1-4条 帮助 已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择发表日期升序发表日期降序提交时间升序提交时间降序题名升序题名降序作者升序作者降序 Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO₂ Super-Lattice 期刊论文 Nanomaterials (Basel, Switzerland), 2019, 卷号: 9, 页码: 1-13 作者:  Ma Hong-Ping[1];  Yang Jia-He[2] 收藏  |  浏览/下载：35/0  |  提交时间：2019/04/22 SiO2  SiOx  plasma-enhanced atomic layer deposition (PEALD)  stoichiometry  superlattice   Effect of deposition temperature on the structural and surface properties of AlN by plasma enhanced atomic layer deposition 期刊论文 Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering, 2016, 卷号: 45, 期号: 4 作者:  Chen, F.;  X. Fang;  S. Wang;  S. Niu;  F. Fang 收藏  |  浏览/下载：14/0  |  提交时间：2017/09/11 Effects of rapid thermal annealing on the properties of aln films deposited by peald on algan/gan heterostructures 期刊论文 Rsc advances, 2015, 卷号: 5, 期号: 47, 页码: 37881-37886 作者:  Cao, Duo;  Cheng, Xinhong;  Xie, Ya-Hong;  Zheng, Li;  Wang, Zhongjian 收藏  |  浏览/下载：44/0  |  提交时间：2019/05/10 Plasma enhanced atomic layer deposition of HfO2 with in situ plasma treatment 期刊论文 MICROELECTRONIC ENGINEERING, 2012, 卷号: 93, 页码: 15-18 Xu, DW; Cheng, XH; Zhang, YW; Wang, ZJ; Xia, C; Cao, D; Yu, YH; Shen, DS 收藏  |  浏览/下载：10/0  |  提交时间：2013/04/17 PEALD  HfO2  Plasma treatment  High-k