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浏览/检索结果: 共7条，第1-7条 帮助 已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择发表日期升序发表日期降序提交时间升序提交时间降序题名升序题名降序作者升序作者降序 Fracture Properties of LPCVD Silicon Nitride and Thermally Grown Silicon Oxide Thin Films From the Load-Deflection of Long Si3N4 and SiO2/Si3N4 Diaphragms 期刊论文 journal of microelectromechanical systems, 2008, 卷号: 17, 期号: 5, 页码: 1120-1134 Yang, JL; Gaspar, J; Paul, O 收藏  |  浏览/下载：24/0  |  提交时间：2010/03/08 Bulge test  fracture  pooled Weibull analysis  silicon nitride (Si3N4)  silicon oxide (SiO2)   Ultra-sensitive, highly reproducible film stress characterization using flexible suspended thin silicon plates and local curvature measurements 期刊论文 journal of micromechanics and microengineering, 2007 Tang, Yu Jie; Chen, Jing; Huang, Yu Bo; Li, Da Chao; Wang, Sha Sha; Li, Zhi Hong; Zhang, Wen Dong 收藏  |  浏览/下载：3/0  |  提交时间：2015/11/13 MICROMACHINED BILAYER CANTILEVERS  MECHANICAL-PROPERTIES  STRAIN   Modifying residual stress and stress gradient in LPCVD Si3N4 film with ion implantation 其他 2006-01-01 Shi, Wendian; Zhang, Haixia; Zhang, Guobing; Li, Zhihong 收藏  |  浏览/下载：4/0  |  提交时间：2015/11/12 LPCVD Si3N4  residual stress  stress gradient  ion implantation  thermal annealing  INTERNAL-STRESS  THIN-FILMS   Evaluating interface effect on stresses in thin films by a local curvature metrology with high accuracy and resolution 其他 2006-01-01 Wang, Shasha; Chen, Jing; Li, Dachao; Huang, Yubo; Li, Zhihong; Zhang, Wendong 收藏  |  浏览/下载：2/0  |  提交时间：2015/11/16 AEMS  residual stress  nano-scale film  interferometry measurement   Modifying residual stress and stress gradient in LPCVD Si3N4 film with ion implantation 期刊论文 Sensors and Actuators, A: Physical, 2006 Shi, Wendian; Zhang, Haixia; Zhang, Guobing; Li, Zhihong 收藏  |  浏览/下载：4/0  |  提交时间：2017/12/03 Modifying residual stress and stress gradient in LPCVD SI3N4 film with ion implantation 其他 2005-01-01 Shi, WD; Zhang, HX; Wang, SS; Zhang, GB; Li, ZH 收藏  |  浏览/下载：3/0  |  提交时间：2015/11/10 LPCVD Si3N4 film  residual stress  stress gradient  ion implantation  INTERNAL-STRESS  THIN-FILMS   Modifying residual stress and stress gradient in LPCVD SI3N 4 film with ion implantation 其他 2005-01-01 Shi, Wendian; Zhang, Haixia; Wang, Shasha; Zhang, Guobing; Li, Zhihong 收藏  |  浏览/下载：1/0  |  提交时间：2015/11/13