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CORC

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Charge trapping effect in HfO2-based high-k gate dielectric stacks after heavy ion irradiation: The role of oxygen vacancy 期刊论文
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2019, 卷号: 459, 页码: 143-147
作者:  Li, Zongzhen;  Liu, Tianqi;  Bi, Jinshun;  Yao, Huijun;  Zhang, Zhenxing
收藏  |  浏览/下载：34/0  |  提交时间：2022/01/19
Latent Reliability Degradation of Ultrathin Amorphous HfO2 Dielectric After Heavy Ion Irradiation: The Impact of Nano-Crystallization 期刊论文
IEEE ELECTRON DEVICE LETTERS, 2019, 卷号: 40, 期号: 10, 页码: 1634-1637
作者:  Li, Zongzhen;  Liu, Jie;  Zhai, Pengfei;  Liu, Tianqi;  Bi, Jinshun
收藏  |  浏览/下载：10/0  |  提交时间：2022/01/19
The Optical Absorption and Photoluminescence Characteristics of Evaporated and IAD HfO2 Thin Films 期刊论文
COATINGS, 2019, 卷号: 9, 期号: 5
作者:  Kong, Mingdong;  Li, Bincheng;  Guo, Chun;  Zeng, Peng;  Wei, Ming
收藏  |  浏览/下载：9/0  |  提交时间：2021/05/06
Laser-induced damage threshold in HfO2/SiO2 multilayer films irradiated by beta-ray 期刊论文
CHINESE PHYSICS B, 2019, 卷号: 28, 页码: 024215
作者:  Fang, Mei-Hua;  Tian, Peng-Yu;  Zhu, Mao-Dong;  Qi, Hong-Ji;  Fei, Tao
收藏  |  浏览/下载：44/0  |  提交时间：2019/04/02
Operando diagnostic detection of interfacial oxygen "breathing' of resistive random access memory by bulk-sensitive hard X-ray photoelectron spectroscopy 期刊论文
MATERIALS RESEARCH LETTERS, 2019, 卷号: 7, 页码: 117-123
作者:  Niu, Gang;  Calka, Pauline;  Huang, Peng;  Sharath, Sankaramangalam Ulhas;  Petzold, Stefan
收藏  |  浏览/下载：24/0  |  提交时间：2019/11/19
Fabrication and characterization of Pr6O11-HfO2 ultra-high temperature infrared radiation coating 期刊论文
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 2019, 卷号: 39, 期号: 14, 页码: 4208-4215
作者:  Liu, Fusheng;  Cheng, Xudong;  Mao, Jiawei;  Li, Shuhao;  Shao, Hao
收藏  |  浏览/下载：11/0  |  提交时间：2019/12/04
厚度对钇掺杂氧化铪薄膜性质的影响 期刊论文
中国陶瓷, 2019, 页码: 61-65
作者:  赵鹏;  周大雨;  孙纳纳
收藏  |  浏览/下载：4/0  |  提交时间：2019/12/02
Enhanced Second Harmonic Generation from Ferroelectric HfO-Based Hybrid Metasurfaces 期刊论文
ACS Nano, 2019, 卷号: Vol.13 No.2, 页码: 1213-1222
作者:  Jun Qin;  Fei Huang;  Xinyue Li;  Longjiang Deng;  Tongtong Kang
收藏  |  浏览/下载：29/0  |  提交时间：2019/12/13
Structural and electrical properties of reactive magnetron sputtered yttrium-doped HfO2 films 期刊论文
CHINESE PHYSICS B, 2018, 卷号: 27
作者:  Zhang, Yu;  Xu, Jun;  Zhou, Da-Yu;  Wang, Hang-Hang;  Lu, Wen-Qi
收藏  |  浏览/下载：6/0  |  提交时间：2019/12/02
Structural and band gaps studies of novel Al2-xHfxO3 materials toward MOS applications 期刊论文
MATERIALS CHEMISTRY AND PHYSICS, 2018, 卷号: 216, 页码: 237-242
作者:  Kamarulzaman, Norlida
收藏  |  浏览/下载：6/0  |  提交时间：2019/11/26

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