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Wafer-Scale Growth of WSe2 Monolayers Toward Phase-Engineered Hybrid WOx/WSe2 Films with Sub-ppb NOx Gas Sensing by a Low-Temperature Plasma-Assisted Selenization Process 期刊论文
CHEMISTRY OF MATERIALS, 2017, 卷号: 29, 期号: 4, 页码: 1587-1598
作者:  Medina, Henry;  Li, Jian-Guang;  Su, Teng-Yu;  Lan, Yann-Wen;  Lee, Shao-Hsin
收藏  |  浏览/下载：19/0  |  提交时间：2019/11/15
Heteroepitaxial growth of wafer scale highly oriented graphene using inductively coupled plasma chemical vapor deposition 期刊论文
2D MATERIALS, 2016, 卷号: 3, 期号: 2
作者:  Gao, Libo;  Xu, Hai;  Li, Linjun;  Yang, Yang;  Fu, Qiang
收藏  |  浏览/下载：17/0  |  提交时间：2019/06/20
Scalable graphene production: perspectives and challenges of plasma applications 期刊论文
NANOSCALE, 2016
Levchenko, Igor; Ostrikov, Kostya; Zheng, Jie; Li, Xingguo; Keidar, Michael; Teo, Kenneth B. K.
收藏  |  浏览/下载：8/0  |  提交时间：2017/12/03
a-IGZO TFTs With Inductively Coupled Plasma Chemical Vapor Deposited SiOx Gate Dielectric 期刊论文
ieee电子器件汇刊, 2013
Xiao, Xiang; Deng, Wei; He, Xin; Zhang, Shengdong
收藏  |  浏览/下载：3/0  |  提交时间：2015/11/11
The structure and optical properties of silicon nanowires prepared by inductively coupled plasma chemical vapor deposition 期刊论文
MATERIALS LETTERS, 2011, 卷号: 65, 期号: 7, 页码: 1117-1119
作者:  Qin, YL;  Li, F;  Liu, DQ;  Yan, HQ;  Wang, JX
收藏  |  浏览/下载：2/0  |  提交时间：2015/05/25
Study on Optical Properties of Type-II SnO2/ZnS Core/Shell Nanowires 期刊论文
journal of physical chemistry c, 2011, 卷号: 115, 期号: 15, 页码: 7225-7229
作者:  Li JB
收藏  |  浏览/下载：37/2  |  提交时间：2011/07/05
Effects of the distance between the inductance coil and substrates on the microstructure and optical properties of silicon films deposited by ICP-CVD 会议论文
4th International Conference on Surface and Interface Science and Engineering (SISE), Lanzhou, PEOPLES R CHINA, 2009
作者:  Wang, JX;  Qin, YL;  Yan, HQ;  Gao, PQ;  Li, JS
收藏  |  浏览/下载：2/0  |  提交时间：2015/07/31
The optoelectronic properties of silicon films deposited by inductively coupled plasma CVD 期刊论文
APPLIED SURFACE SCIENCE, 2010, 卷号: 257, 期号: 3, 页码: 817-822
作者:  Qin, YL;  Yan, HQ;  Li, F;  Qiao, L;  Liu, QM
收藏  |  浏览/下载：4/0  |  提交时间：2015/05/25
基于回归正交设计的ICP刻蚀机工艺腔室流场特性分析 期刊论文
2010, 2010
程嘉; 朱煜; 段广洪; 王春洪; Cheng Jia; Zhu Yu; Duan Guanghong; Wang Chunhong
收藏  |  浏览/下载：5/0
Analysis of processing chamber flow field characteristics for an ICP etcher based on regression orthogonal design 期刊论文
2010, 2010
Cheng Jia; Zhu Yu; Duan Guanghong; Wang Chunhong
收藏  |  浏览/下载：4/0

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