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科研机构
半导体研究所 [15]
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期刊论文 [14]
会议论文 [1]
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2008 [1]
2003 [6]
2002 [1]
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半导体材料 [15]
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The effects of substrate temperature on the structure and properties of ZnO films prepared by pulsed laser deposition
期刊论文
vacuum, 2008, 卷号: 82, 期号: 5, 页码: 495-500
Zhu, BL
;
Sun, XH
;
Zha, XZ
;
Su, FH
;
Li, GH
;
Wu, XG
;
Wu, J
;
Wu, R
;
Liu, J
收藏
  |  
浏览/下载:46/1
  |  
提交时间:2010/03/08
PLD
ZnO films
substrate temperature
crystal quality
grain size
optical properties
Effects of reactor pressure on GaN nucleation layers and subsequent GaN epilayers grown on sapphire substrate
期刊论文
journal of crystal growth, 2003, 卷号: 254, 期号: 3-4, 页码: 348-352
作者:
Zhang SM
收藏
  |  
浏览/下载:230/30
  |  
提交时间:2010/08/12
in situ laser reflectometry
lateral overgrowth
metalorganic chemical vapor deposition
GaN
CHEMICAL-VAPOR-DEPOSITION
HIGH-QUALITY GAN
BUFFER LAYER
THREADING DISLOCATIONS
TEMPERATURE
EVOLUTION
SURFACE
MOVPE
Microstructure of GaN films grown on Si(111) substrates by metalorganic chemical vapor deposition
期刊论文
journal of crystal growth, 2003, 卷号: 256, 期号: 3-4, 页码: 416-423
Hu GQ
;
Kong X
;
Wan L
;
Wang YQ
;
Duan XF
;
Lu Y
;
Liu XL
收藏
  |  
浏览/下载:25/0
  |  
提交时间:2010/08/12
amorphous layer
dislocation
transmission electron microscopy
metalorganic chemical vapor deposition
GaN
MOLECULAR-BEAM EPITAXY
HIGH-QUALITY GAN
HETEROEPITAXIAL GROWTH
ELECTRON-DIFFRACTION
DEFECT STRUCTURE
HETEROSTRUCTURE
DISLOCATIONS
MICROSCOPY
(111)SI
LAYER
Influence of high-temperature AIN buffer thickness on the properties of GaN grown on Si(111)
期刊论文
journal of crystal growth, 2003, 卷号: 258, 期号: 1-2, 页码: 34-40
作者:
Zhao DG
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  |  
浏览/下载:299/12
  |  
提交时间:2010/08/12
metalorganic chemical vapor deposition
nitrides
semiconductor III-V materials
MOLECULAR-BEAM EPITAXY
HIGH-QUALITY GAN
CHEMICAL-VAPOR-DEPOSITION
INTERMEDIATE LAYER
ALAS
ALN
SURFACES
SILICON
FILMS
Formation mechanism of amorphous layer at the interface of Si(111) substrate and AlN buffer layer for GaN
期刊论文
journal of materials science letters, 2003, 卷号: 22, 期号: 22, 页码: 1581-1583
Hu GQ
;
Kong X
;
Wang YQ
;
Wan L
;
Duan XF
;
Lu Y
;
Liu XL
收藏
  |  
浏览/下载:59/0
  |  
提交时间:2010/08/12
MOLECULAR-BEAM EPITAXY
HIGH-QUALITY GAN
HETEROEPITAXIAL GROWTH
HETEROSTRUCTURES
Influences of reactor pressure of GaN buffer layers on morphological evolution of GaN grown by MOCVD
期刊论文
journal of crystal growth, 2003, 卷号: 256, 期号: 3-4, 页码: 248-253
作者:
Zhang SM
收藏
  |  
浏览/下载:293/3
  |  
提交时间:2010/08/12
in situ laser reflectometry
lateral overgrowths
surface morphology
metalorganic chemical vapor deposition
GaN
CHEMICAL-VAPOR-DEPOSITION
LIGHT-EMITTING-DIODES
SAPPHIRE SUBSTRATE
NUCLEATION LAYERS
QUALITY
TEMPERATURE
X-ray diffraction analysis of MOCVD grown GaN buffer layers on GaAs(001) substrates
期刊论文
journal of crystal growth, 2003, 卷号: 254, 期号: 1-2, 页码: 23-27
Shen XM
;
Wang YT
;
Zheng XH
;
Zhang BS
;
Chen J
;
Feng G
;
Yang H
收藏
  |  
浏览/下载:111/0
  |  
提交时间:2010/08/12
buffer layers
x-ray diffraction
metalorganic chemical vapor deposition
nitrides
VAPOR-PHASE EPITAXY
NUCLEATION LAYERS
CUBIC GAN
(001)GAAS SUBSTRATE
STRAIN RELAXATION
TEMPERATURE
DEPOSITION
QUALITY
DIODES
Structural characteristic of cubic GaN nucleation layers on GaAs(001) substrates by MOCVD
期刊论文
journal of crystal growth, 2002, 卷号: 242, 期号: 1-2, 页码: 124-128
Zheng XH
;
Feng ZH
;
Wang YT
;
Zheng WL
;
Jia QJ
;
Jiang XM
;
Yang H
;
Liang JW
收藏
  |  
浏览/下载:125/0
  |  
提交时间:2010/08/12
nucleation layers
X-ray diffraction
metalorganic chemical vapor deposition
gallium compounds
nitrides
LIGHT-EMITTING-DIODES
CHEMICAL-VAPOR-DEPOSITION
AIN BUFFER LAYER
GROWN GAN
SAPPHIRE SUBSTRATE
QUALITY
FILMS
BLUE
TEMPERATURE
EVOLUTION
Effect of in situ thermal treatment during growth on crystal quality of GaN epilayer grown on sapphire substrate by MOVPE
期刊论文
journal of crystal growth, 2001, 卷号: 222, 期号: 1-2, 页码: 110-117
Xu HZ
;
Takahashi K
;
Wang CX
;
Wang ZG
;
Okada Y
;
Kawabe M
;
Harrison I
;
Foxon CT
收藏
  |  
浏览/下载:54/0
  |  
提交时间:2010/08/12
gallium nitride
metalorganic vapor-phase epitaxy (MOVPE) annealing
crystal quality
CHEMICAL-VAPOR-DEPOSITION
MOLECULAR-BEAM EPITAXY
BUFFER LAYER
PHASE EPITAXY
DEPENDENCE
DEFECTS
Influence of crystal perfection on the reverse leakage current of the SiGe Si p-n heterojunction diodes
期刊论文
journal of crystal growth, 1999, 卷号: 201, 期号: 0, 页码: 551-555
作者:
Liu XF
收藏
  |  
浏览/下载:27/0
  |  
提交时间:2010/08/12
reverse leakage current
crystalline quality
SiGe Se p-n heterojunction diodes
LAYERS
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