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Abnormal crystallization of silicon thin films deposited by ICP-CVD 期刊论文
CHINESE PHYSICS LETTERS, 2005, 卷号: 22, 期号: 12, 页码: 3130-3132
作者:  Li, JS;  Yin, M;  Wang, JX;  He, DY
收藏  |  浏览/下载:0/0  |  提交时间:2015/05/25
Al-induced crystallization during low-temperature deposition of Si films by inductively coupled plasma CVD 会议论文
11th China-Korea Symposium on Thin Film Materials, Chengdu, PEOPLES R CHINA, JUN 28-JUL 05, 2004
作者:  He, DY;  Wang, XQ;  Chen, Q;  Li, JS
收藏  |  浏览/下载:2/0  |  提交时间:2015/07/31
Aluminum-induced crystallization during deposition of silicon films by inductively coupled plasma CVD 期刊论文
ACTA PHYSICA SINICA/物理学报, 2005, 卷号: 54, 期号: 1, 页码: 269-273
作者:  Wang, XQ;  Li, JS;  Chen, Q;  Qi, J;  Yin, M
收藏  |  浏览/下载:5/0  |  提交时间:2015/05/25


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