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浏览/检索结果: 共7条，第1-7条 帮助 限定条件 专题：华南理工大学    第一署名单位    第一作者单位    通讯作者单位     已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 A Paradigm Shift in Patterning Foundation from Frequency Multiplication to Edge-Placement Accuracy - A Novel Processing Solution by Selective (CPCI-S收录) 会议 作者:  Han, Ting[1];  Liu, Hongyi[1];  Chen, Yijian[1] 收藏  |  浏览/下载：19/0  |  提交时间：2019/04/11 edge-placement errors (EPE)  alternating-material (dual-material) self-aligned multiple patterning (altSAMP)  alternating-material (dual-material) self-aligned quadruple/sextuple patterning (altSAQP/altSASP)  selective etching  cut-hole layout decomposition  probability of failure (POF)   Layout Decomposition and Synthesis for a Modular Technology to Solve the Edge-Placement Challenges by Combining Selective Etching, Direct Sti (CPCI-S收录) 会议 作者:  Liu, Hongyi[1];  Han, Ting[1];  Zhou, Jun[1];  Chen, Yijian[1] 收藏  |  浏览/下载：12/0  |  提交时间：2019/04/11 edge-placement errors (EPE)  selective etching  alternating-material (dual-material) self-aligned multiple patterning (altSAMP)  alternating-material (dual-material) self-aligned quadruple/sextuple patterning (altSAQP/altSASP)  direct stitching  layout decomposition and synthesis   Breaking Through 1-D Layout Limitations and Regaining 2-D Design Freedom Part I: 2-D Layout Decomposition and Stitching Techniques for Hybrid (CPCI-S收录) 会议 作者:  Liu, Hongyi[1];  Zhou, Jun[1];  Chen, Yijian[1] 收藏  |  浏览/下载：10/0  |  提交时间：2019/04/11 self-aligned multiple patterning (SAMP)  positive-tone self-aligned sextuple patterning (pSASP)  hybrid SAMP  stitching  layout decomposition and synthesis   Process Characteristics and Layout Decomposition of Self-aligned Sextuple Patterning (CPCI-S收录) 会议论文 DESIGN FOR MANUFACTURABILITY THROUGH DESIGN-PROCESS INTEGRATION VII 作者:  Kang, Weiling[1];  Chen, Yijian[1] 收藏  |  浏览/下载：8/0  |  提交时间：2019/04/15 Self-aligned sextuple patterning (SASP)  conflicting graph  assisting mandrels  layout decomposition   A Layout Decomposition Algorithm for Self-Aligned Multiple Patterning (CPCI-S收录) 会议论文 DESIGN-PROCESS-TECHNOLOGY CO-OPTIMIZATION FOR MANUFACTURABILITY VIII 作者:  You, Jun[1];  Liu, Hongyi[1];  Chen, Yijian[1] 收藏  |  浏览/下载：11/0  |  提交时间：2019/04/12 self-aligned multiple patterning (SAMP)  self-aligned quadruple patterning (SAQP)  self-aligned sextuple patterning (SASP)  layout decomposition  coloring   A Comparative Study of Self-Aligned Quadruple and Sextuple Patterning Techniques for Sub-15nm IC Scaling (CPCI-S收录) 会议论文 OPTICAL MICROLITHOGRAPHY XXVI 作者:  Chen, Yijian[1];  Kang, Weiling[1];  Zhang, Pan[1] 收藏  |  浏览/下载：8/0  |  提交时间：2019/04/15 self-aligned quadruple/sextuple patterning (SAQP/SASP)  layout decomposition/syntheses  assisting mandrels  overlay error  probability of failure (POF)   Technological Merits, Process Complexity, and Cost Analysis of Self-aligned Multiple Patterning (CPCI-S收录) 会议论文 OPTICAL MICROLITHOGRAPHY XXV, PTS 1AND 2 作者:  Chen, Yijian[1];  Cheng, Qi[1];  Kang, Weiling[1] 收藏  |  浏览/下载：11/0  |  提交时间：2019/04/15 Self-aligned multiple patterning (SAMP)  self-aligned double (SADP)  triple (SATP)  quadruple (SAQP)  sextuple (SASP)  octuple (SAOP) patterning  mandrel  spacer