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Impact of gate coupling and misalignment on performance of double-gate organic thin film transistors 期刊论文
JAPANESE JOURNAL OF APPLIED PHYSICS, 2015
Han, Jingwen; Sun, Lei; Xu, Hao; Zhang, Yibo; Zhang, Shengdong; Wang, Yi
收藏  |  浏览/下载:3/0  |  提交时间:2017/12/03
Impact of gate coupling and misalignment on performance of double-gate organic thin film transistors 其他
2015-01-01
Han, Jingwen; Sun, Lei; Xu, Hao; Zhang, Yibo; Zhang, Shengdong; Wang, Yi
收藏  |  浏览/下载:3/0  |  提交时间:2017/12/04
VDNROM: A novel four-bits-per-cell vertical channel dual-nitride-trapping- layer ROM for high density flash memory applications 其他
2007-01-01
Zhou, Falong; Cai, Yimao; Huang, Ru; Li, Yan; Shan, Xiaonan; Liu, Jia; Guo, Ao; Zhang, Xing; Wang, Yangyuan
收藏  |  浏览/下载:2/0  |  提交时间:2015/11/10
VDNROM: A novel four-physical-bits/cell vertical channel dual-nitride-trapping-layers ROM for high density flash memory applications 其他
2007-01-01
Zhou, Falong; Cai, Ylinao; Huang, Ru; Li, Yan; Shan, Xiaonan; Liu, Jla; Guo, Ao; Zhang, Xing; Wang, Yangyuan
收藏  |  浏览/下载:2/0  |  提交时间:2015/11/12
VDNROM: A novel four-physical-bits/cell vertical channel dual-nitride-trapping-layers ROM for high density flash memory applications 期刊论文
Solid-State Electronics, 2007
Zhou, Falong; Cai, Yimao; Huang, Ru; Li, Yan; Shan, Xiaonan; Liu, Jia; Guo, Ao; Zhang, Xing; Wang, Yangyuan
收藏  |  浏览/下载:6/0  |  提交时间:2017/12/03
Extraction of equivalent oxide thickness for HfO2 high k gate dielectrics 期刊论文
pan tao ti hsueh paochinese journal of semiconductors, 2006
Chen, Yong; Zhao, Jianming; Han, Dedong; Kang, Jinfeng; Han, Ruqi
收藏  |  浏览/下载:4/0  |  提交时间:2015/11/17
VDNROM: A novel four-bits-per-cell vertical channel dual-nitride-trapping-layer ROM for high density flash memory applications 其他
2006-01-01
Zhou, Falong; Cai, Yimao; Huang, Ru; Li, Yan; Shan, Xiaonan; Liu, Jia; Guo, Ao; Zhang, Xing; Wang, Yangyuan
收藏  |  浏览/下载:3/0  |  提交时间:2015/11/13
Charactcristics of sub-1 nm CVID HfO2 gate dielectrics with HfN electrodcs for advanccd CMOS applications 其他
2004-01-01
Kang, JF; Yu, HY; Ren, C; Wang, XP; Li, MF; Chan, DSH; Liu, XY; Han, RQ; Wang, YY; Kwong, DL
收藏  |  浏览/下载:2/0  |  提交时间:2015/11/13
Characteristics of sub-1 nm CVD HfO2 gate dielectrics with HfN electrodes for advanced CMOS applications 其他
2004-01-01
Kang, J.F.; Yu, H.Y.; Ren, C.; Wang, X.P.; Li, M.-F.; Chan, D.S.H.; Liu, X.Y.; Han, R.Q.; Wang, Y.Y.; Kwong, D.-L.
收藏  |  浏览/下载:4/0  |  提交时间:2015/11/13


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