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ALE of SiO2 by alternating CF4 plasma with energetic Ar+ plasma beams 会议论文
7th international conference on microelectronics and plasma technology
作者:  Dong W(董婉);  Dai ZL(戴忠玲);  Song YH(宋远红);  Wang YN(王友年)
收藏  |  浏览/下载:11/0  |  提交时间:2019/12/02
Accuracy control of SiO2 etching in inductively coupled CF4/Ar plasmas 会议论文
1st Asia-Pacific Conference on Plasma Physics, 18-23, 09.2017
作者:  Dai ZL(戴忠玲);  Wang YN(王友年)
收藏  |  浏览/下载:3/0  |  提交时间:2019/12/02
Change of hydrophobicity on silicone rubber modified by CF4 capacitively coupled plasma and inductively coupled plasma 会议论文
5th International Conference on Surface Engineering, Dalian Univ Technol, Dalian, PEOPLES R CHINA, 2008-01-01
作者:  Gao, S. H.;  Liu, Y.;  Lei, M. K.;  Wen, L. S.
收藏  |  浏览/下载:3/0  |  提交时间:2019/12/27
Change of hydrophobicity on silicone rubber modified by CF4 capacitively coupled plasma and inductively coupled plasma 会议论文
Key Engineering Materials, 2008-01-01
作者:  Gao, S.H.;  Liu, Y.;  Lei, M.K.;  Wen, L.S.
收藏  |  浏览/下载:1/0  |  提交时间:2019/12/27


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