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Influence of the substrate bias voltage on the physical properties of dc reactive sputtered Ta2O5 films 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2013, 卷号: 573, 期号: 550, 页码: 258—262
曹鸿涛、Y.S. Zou; K. Cang a,b, L.Y. Liang b, Z.M. Liu b, L. Wub, H. Luo b, H.T. Cao b,⇑, Y.S. Zou a,⇑
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Influence of the substrate bias voltage on the physical properties of dcreactive sputtered Ta2O5 films 期刊论文
Journal of Alloys and Compounds, 2012, 期号: 550, 页码: 258—262
曹鸿涛、邹友生; K. Cang a,b, L.Y. Liang b, Z.M. Liu b, L. Wub, H. Luo b, H.T. Cao b,⇑, Y.S. Zou a,⇑
收藏  |  浏览/下载:21/0  |  提交时间:2013/12/16


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