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Interface of wet oxidized AlGaAs/GaAs distributed Bragg reflectors 期刊论文
applied physics a-materials science & processing, 2007, 卷号: 86, 期号: 1, 页码: 19-22
Li RY (Li R. Y.); Wang ZG (Wang Z. G.); Xu B (Xu B.); Jin P (Jin P.); Guo X (Guo X.); Chen M (Chen M.)
收藏  |  浏览/下载:59/0  |  提交时间:2010/04/11
Structural and optical properties of ZnO films on Si substrates using a gamma-Al2O3 buffer layer 期刊论文
journal of physics d-applied physics, 2006, 卷号: 39, 期号: 2, 页码: 269-273
Shen WJ; Wang J; Wang QY; Duan Y; Zeng YP
收藏  |  浏览/下载:49/0  |  提交时间:2010/04/11
Time dependence of wet oxidized AlGaAs/GaAs distributed Bragg reflectors 期刊论文
journal of vacuum science & technology b, 2005, 卷号: 23, 期号: 5, 页码: 2137-2140
作者:  Xu B;  Jin P
收藏  |  浏览/下载:141/18  |  提交时间:2010/03/17
Crystallization of amorphous Si films by pulsed laser annealing and their structural characteristics 期刊论文
semiconductor science and technology, 2004, 卷号: 19, 期号: 6, 页码: 759-763
Peng YC; Fu GS; Yu W; Li SQ; Wang YL
收藏  |  浏览/下载:54/15  |  提交时间:2010/03/09
Hydrogen behavior in GaN epilayers grown by NH3-MBE 期刊论文
journal of crystal growth, 2001, 卷号: 227, 期号: 0, 页码: 371-375
Kong MY; Zhang JP; Wang XL; Sun DZ
收藏  |  浏览/下载:99/8  |  提交时间:2010/08/12
Structural evaluation of polycrystalline silicon thin films by hot-wire-assisted PECVD 期刊论文
thin solid films, 2001, 卷号: 395, 期号: 1-2, 页码: 213-216
Feng Y; Zhu M; Liu F; Liu J; Han H; Han Y
收藏  |  浏览/下载:161/11  |  提交时间:2010/08/12
Relaxed GexSi1-x layer formation with reduced dislocation density grown by ultrahigh vacuum chemical vapor deposition 期刊论文
applied physics a-materials science & processing, 2000, 卷号: 70, 期号: 4, 页码: 449-451
Luo GL; Chen PY; Lin XF; Tsien P; Fan TW
收藏  |  浏览/下载:51/0  |  提交时间:2010/08/12
Electrical properties of GaN deposited on nitridated sapphire by molecular beam epitaxy using NH3 cracked on the growing surface 期刊论文
journal of crystal growth, 1999, 卷号: 201, 期号: 0, 页码: 429-432
Zhang JP; Sun DZ; Li XB; Wang XL; Kong MY; Zeng YP; Li JM; Lin LY
收藏  |  浏览/下载:31/0  |  提交时间:2010/08/12
Comparative study of the structural properties of nanocrystalline Ge : H plasma deposited onto the cathode and the anode using high hydrogen dilutions 期刊论文
thin solid films, 1999, 卷号: 346, 期号: 1-2, 页码: 91-95
Poulsen PR; Wang MX; Xu J; Li W; Chen KJ; Wang GH; Feng D
收藏  |  浏览/下载:32/0  |  提交时间:2010/08/12


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