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Thermal FLUX laser annealing for ion implantation of semiconductor p-n junctions 专利
专利号: WO2007018567A1, 申请日期: 2007-02-15, 公开日期: 2007-02-15
作者:  ADAMS, BRUCE, E.;  JENNINGS, DEAN;  MAYUR, ABHILASH, J.;  PARHIHAR, VIJAY;  RANISH, JOSEPH, M.
收藏  |  浏览/下载:11/0  |  提交时间:2019/12/31
Long-wavelength VCSEL system with implant current confinement 专利
专利号: US20070025408A1, 申请日期: 2007-02-01, 公开日期: 2007-02-01
作者:  KOELLE, BERNHARD ULRICH;  SU, CHUNG-YI
收藏  |  浏览/下载:3/0  |  提交时间:2019/12/31
Large area direct current (DC) pulse plasma base low energy implantation device for use in material surface engineering has low energy ion implantation power supply which outputs predetermined DC pulse negative bias voltage on sample table. 专利
申请日期: 2007-01-01, 公开日期: 2007-10-03
作者:  LEI M GUO J GAO F YUAN L ZHANG Z
收藏  |  浏览/下载:2/0  |  提交时间:2019/12/27


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