Turning electronic performance and Schottky barrier of graphene/β-Si3N4 (0001) heterostructure by external strain and electric field | |
Lu, Xuefeng; Li, Lingxia; Luo, Jianhua; Guo, Xin; Ren, Junqiang; Xue, Hongtao; Li, Hui | |
刊名 | Vacuum |
2021-06-01 | |
卷号 | 188 |
关键词 | Optoelectronic devices Schottky barrier diodes Van der Waals forces Electronic performance Electronics devices External strains First principle calculations Optoelectronics devices P-type Schottky barriers Schottky contacts Si$-3$/N$-4$ Van der Waal |
ISSN号 | 0042-207X |
DOI | 10.1016/j.vacuum.2021.110208 |
英文摘要 | Graphene-based van der Waals (vdW) heterostructures have currently emerged as a promising application in the construction of next-generation electronic and optoelectronic devices. In this present contribution, through the comprehensive first-principle calculations, the electronic characteristics along with the Schottky barrier of graphene/β-silicon nitride(0001) heterostructure are theoretically investigated, considering external strain and electric fields effects. The results concluded that the electronic performance of both the graphene monolayer and β-Si3N4(0001) surface are perfectly maintained in the heterostructure on account of a weak interlayer vdW force between them. Furthermore, the graphene/β-Si3N4 (0001) heterostructure forms a p-type Schottky contact with the SBH of 0.72 eV, which can be modified by using normal strain or perpendicular electric field. It is found that the heterostructure still maintains a p-type Schottky contact when the interlayer spacing from 2.2 Å to 4.4 Å or when the applied positive electric field is smaller than 0.2 V/Å. Most importantly, a transformation from the p-type Schottky contact to Ohmic one is observed in the heterostructure at an electric field of +0.2 V/Å. The above results are expected to provide a practical guidance for designing and fabrication of the novel nanoelectronic devices based on graphene/β-Si3N4 vdW heterostructure. © 2021 |
WOS研究方向 | Materials Science ; Physics |
语种 | 英语 |
出版者 | Elsevier Ltd |
WOS记录号 | WOS:000649683500003 |
内容类型 | 期刊论文 |
源URL | [http://ir.lut.edu.cn/handle/2XXMBERH/148453] |
专题 | 材料科学与工程学院 省部共建有色金属先进加工与再利用国家重点实验室 |
作者单位 | State Key Laboratory of Advanced Processing and Recycling of Non-ferrous Metal, Department of Materials Science and Engineering, Lanzhou University of Technology, Lanzhou; 730050, China |
推荐引用方式 GB/T 7714 | Lu, Xuefeng,Li, Lingxia,Luo, Jianhua,et al. Turning electronic performance and Schottky barrier of graphene/β-Si3N4 (0001) heterostructure by external strain and electric field[J]. Vacuum,2021,188. |
APA | Lu, Xuefeng.,Li, Lingxia.,Luo, Jianhua.,Guo, Xin.,Ren, Junqiang.,...&Li, Hui.(2021).Turning electronic performance and Schottky barrier of graphene/β-Si3N4 (0001) heterostructure by external strain and electric field.Vacuum,188. |
MLA | Lu, Xuefeng,et al."Turning electronic performance and Schottky barrier of graphene/β-Si3N4 (0001) heterostructure by external strain and electric field".Vacuum 188(2021). |
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