Novel GAA Si Nanowire p-MOSFETs With Excellent Short-Channel Effect Immunity via an Advanced Forming Process
Zhang QZ(张青竹); Yin HX(殷华湘); Meng LK(孟令款); Yao JX(姚佳欣); Li JJ(李俊杰); Wang GL(王桂磊); Li YD(李昱东); Wu ZH(吴振华); Xiong WJ(熊文娟); Hong Yang
刊名IEEE Electron Device Letters
2018-02-19
文献子类期刊论文
内容类型期刊论文
源URL[http://159.226.55.107/handle/172511/19083]  
专题微电子研究所_集成电路先导工艺研发中心
作者单位中国科学院微电子研究所
推荐引用方式
GB/T 7714
Zhang QZ,Yin HX,Meng LK,et al. Novel GAA Si Nanowire p-MOSFETs With Excellent Short-Channel Effect Immunity via an Advanced Forming Process[J]. IEEE Electron Device Letters,2018.
APA Zhang QZ.,Yin HX.,Meng LK.,Yao JX.,Li JJ.,...&Ye TC.(2018).Novel GAA Si Nanowire p-MOSFETs With Excellent Short-Channel Effect Immunity via an Advanced Forming Process.IEEE Electron Device Letters.
MLA Zhang QZ,et al."Novel GAA Si Nanowire p-MOSFETs With Excellent Short-Channel Effect Immunity via an Advanced Forming Process".IEEE Electron Device Letters (2018).
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