Novel GAA Si Nanowire p-MOSFETs With Excellent Short-Channel Effect Immunity via an Advanced Forming Process | |
Zhang QZ(张青竹); Yin HX(殷华湘); Meng LK(孟令款); Yao JX(姚佳欣); Li JJ(李俊杰); Wang GL(王桂磊); Li YD(李昱东); Wu ZH(吴振华); Xiong WJ(熊文娟); Hong Yang | |
刊名 | IEEE Electron Device Letters |
2018-02-19 | |
文献子类 | 期刊论文 |
内容类型 | 期刊论文 |
源URL | [http://159.226.55.107/handle/172511/19083] |
专题 | 微电子研究所_集成电路先导工艺研发中心 |
作者单位 | 中国科学院微电子研究所 |
推荐引用方式 GB/T 7714 | Zhang QZ,Yin HX,Meng LK,et al. Novel GAA Si Nanowire p-MOSFETs With Excellent Short-Channel Effect Immunity via an Advanced Forming Process[J]. IEEE Electron Device Letters,2018. |
APA | Zhang QZ.,Yin HX.,Meng LK.,Yao JX.,Li JJ.,...&Ye TC.(2018).Novel GAA Si Nanowire p-MOSFETs With Excellent Short-Channel Effect Immunity via an Advanced Forming Process.IEEE Electron Device Letters. |
MLA | Zhang QZ,et al."Novel GAA Si Nanowire p-MOSFETs With Excellent Short-Channel Effect Immunity via an Advanced Forming Process".IEEE Electron Device Letters (2018). |
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