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Control of the discharge chemistry of CHF in dual-frequency capacitively coupled plasmas 期刊论文
Applied Physics Letters, 2008, 卷号: Vol.93 No.7, 页码: 071503
作者:  By:Yuan, QH [ 1 ];  Ye, C [ 1 ];  Xin, Y [ 1 ];  Huang, XJ [ 1 ];  Ning, ZY [ 1 ]
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