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浏览/检索结果: 共5条，第1-5条 帮助 已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 Effects of different fertilization conditions and different geographical locations on the diversity and composition of the rhizosphere microbiota of Qingke (Hordeum vulgare L.) plants in different growth stages (vol 14, 1094034, 2023) 期刊论文 FRONTIERS IN MICROBIOLOGY, 2023, 卷号: 14 作者:  Wang, Lei;  Wang, Handong;  Liu, Meijin;  Xu, Jinqing;  Bian, Haiyan 收藏  |  浏览/下载：1/0  |  提交时间：2023/12/01 Effects of different fertilization conditions and different geographical locations on the diversity and composition of the rhizosphere microbiota of Qingke (Hordeum vulgare L.) plants in different growth stages 期刊论文 FRONTIERS IN MICROBIOLOGY, 2023, 卷号: 14 作者:  Wang, Lei;  Wang, Handong;  Liu, Meijin;  Xu, Jinqing;  Bian, Haiyan 收藏  |  浏览/下载：1/0  |  提交时间：2023/12/01 Surface morphology and interface reaction of Cu/SiO2/Si (111) systems prepared by radio frequency magnetron sputtering 会议论文 2012 International Conference on Emerging Materials and Mechanics Applications, ICEMMA 2012, Hangzhou, China, February 5, 2012 - February 6, 2012 作者:  Cao, Bo;  Yang, Tongrui;  Li, Gongping 收藏  |  浏览/下载：5/0  |  提交时间：2017/01/20 Interfaces (materials)  Deposition  Film preparation  Magnetron sputtering  Radio waves  Scanning electron microscopy  Silicides  Silicon  Silicon oxides  Surface morphology  Thin films  Vapor deposition  X ray diffraction  Cu films  Interface reaction  Radio frequency magnetron sputtering  Scanning electron microscopy (SEM)  X-ray diffraction (XRD)   Surface morphology and roughness of Cu thin films prepared by ionized cluster beam deposition 会议论文 2012 International Conference on Frontiers of Advanced Materials and Engineering Technology, FAMET 2012, Xiamen, China, January 4, 2012 - January 5, 2012 作者:  Cao, Bo;  Yang, Tongrui;  Li, Gongping;  Cho, Seong Jin;  Kim, Hee 收藏  |  浏览/下载：2/0  |  提交时间：2017/01/20 Surface morphology  Atomic force microscopy  Chemical modification  Copper  Deposition  Engineering technology  Ionization  Ions  Morphology  Semiconducting silicon compounds  Surface roughness  Surfaces  Thin films  Vapor deposition  Acceleration voltages  Average grain size  Cu Films  Cu thin film  Deposition conditions  Ionized cluster beam deposition  Ionized cluster beams  P-type Si   XPS spectra of cu thin films prepared by ionized cluster beam deposition 会议论文 2nd International Symposium on Chemical Engineering and Material Properties, ISCEMP 2012, Taiyuan, Shanxi, China, June 22, 2012 - June 24, 2012 作者:  Cao, Bo;  Yang, Tongrui;  Li, Gongping;  Cho, Seongjin;  Kim, Hee 收藏  |  浏览/下载：6/0  |  提交时间：2017/01/20 X ray photoelectron spectroscopy  Atoms  Binding energy  Chemical engineering  Chemical modification  Deposits  Ions  Photoelectrons  Silicon  Surface properties  Thin films  Vapor deposition  Atomic binding  Bulk materials  Copper films  Cu thin film  Ionized cluster beam deposition  Ionized cluster beams  Local energy  Neutral clusters  P-type Si  XPS spectra