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CORC

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Fascin-1 Contributes to Neuropathic Pain by Promoting Inflammation in Rat Spinal Cord 期刊论文
NEUROCHEMICAL RESEARCH, 2018, 卷号: 43, 期号: 2
作者:  Wang, Binbin;  Fan, Bingbing;  Dai, Qijun;  Xu, Xingguo;  Jiang, Peipei
收藏  |  浏览/下载：9/0  |  提交时间：2019/12/05
Study on atomic layer etching of Si in inductively coupled Ar/Cl-2 plasmas driven by tailored bias waveforms 期刊论文
PLASMA SCIENCE & TECHNOLOGY, 2017, 卷号: 19
作者:  Ma, Xiaoqin;  Zhang, Saiqian;  Dai, Zhongling;  Wang, Younian
收藏  |  浏览/下载：2/0  |  提交时间：2019/12/09
Hybrid Simulation of Duty Cycle Influences on Pulse Modulated RF SiH4/Ar Discharge 期刊论文
PLASMA SCIENCE & TECHNOLOGY, 2016, 卷号: 18, 页码: 394-399
作者:  Wang Xifeng;  Song Yuanhong;  Zhao Shuxia;  Dai Zhongling;  Wang Younian
收藏  |  浏览/下载：10/0  |  提交时间：2019/12/09
A Multi-Scale Study on Silicon-Oxide Etching Processes in C4F8/Ar Plasmas 期刊论文
PLASMA SCIENCE & TECHNOLOGY, 2016, 卷号: 18, 页码: 666-673
作者:  Sui Jiaxing;  Zhang Saiqian;  Liu Zeng;  Yan Jun;  Dai Zhongling
收藏  |  浏览/下载：2/0  |  提交时间：2019/12/09
Effects of Tailed Pulse-Bias on Ion Energy Distributions and Charging Effects on Insulating Substrates 期刊论文
PLASMA SCIENCE & TECHNOLOGY, 2015, 卷号: 17, 页码: 560-566
作者:  Liu Zeng;  Dai Zhongling;  He Caiqiang;  Wang Younian
收藏  |  浏览/下载：2/0  |  提交时间：2019/12/09
Simulation of Capacitively Coupled Dual-Frequency N-2, O-2, N-2/O-2 Discharges: Effects of External Parameters on Plasma Characteristics 期刊论文
PLASMA SCIENCE & TECHNOLOGY, 2014, 卷号: 16, 页码: 335-343
作者:  You Zuowei;  Dai Zhongling;  Wang Younian
收藏  |  浏览/下载：3/0  |  提交时间：2019/12/09
Effects of Low-Frequency Source on a Dual-Frequency Capacitive Sheath near a Concave Electrode 期刊论文
PLASMA SCIENCE & TECHNOLOGY, 2014, 卷号: 16, 页码: 320-323
作者:  Hao Meilan;  Dai Zhongling;  Wang Younian
收藏  |  浏览/下载：3/0  |  提交时间：2019/12/09
Nanoscale Lamellar Monoclinic Li2MnO3 Phase with Stacking Disordering in Lithium-Rich and Oxygen-Deficient Li1.07Mn1.93O4-delta Cathode Materials 期刊论文
ACS APPLIED MATERIALS & INTERFACES, 2014, 卷号: 6, 期号: 2
作者:  Xu, Zhongling;  Wang, Jianbo;  Zhang, Ke;  Zheng, He;  Dai, Zhong-Xu
收藏  |  浏览/下载：9/0  |  提交时间：2019/12/05
Feature Profile Evolution During Etching of SiO2 in Radio-Frequency or Direct-Current Plasmas 期刊论文
PLASMA SCIENCE & TECHNOLOGY, 2012, 卷号: 14, 页码: 64-70
作者:  Zhao Zhanqiang;  Dai Zhongling;  Wang Younian
收藏  |  浏览/下载：7/0  |  提交时间：2019/12/13
Simulations of Ion Behaviors in a Photoresist Trench During Plasma Etching Driven by a Radio-Frequency Source 期刊论文
PLASMA SCIENCE & TECHNOLOGY, 2012, 卷号: 14, 页码: 240-244
作者:  Dai Zhongling;  Yue Guang;  Wang Younian
收藏  |  浏览/下载：4/0  |  提交时间：2019/12/13

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