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浏览/检索结果: 共9条，第1-9条 帮助 已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 Pore filling behavior of YSZ under CMAS attack: Implications for designing corrosion-resistant thermal barrier coatings 期刊论文 Journal of the American Ceramic Society, 2018, 卷号: 101, 期号: 12, 页码: 5756-5770 作者:  Shan, Xiao;  Luo, Lirong;  Chen, Wenfu;  Zou, Zhonghua;  Guo, Fangwei 收藏  |  浏览/下载：34/0  |  提交时间：2018/12/28 Visualization of resist flow fields in microlithography by using defocusing digital particle image velocimetry 期刊论文 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2013, 卷号: 12, 期号: [db:dc_citation_issue] 作者:  Du Jun;  Wei Zhengying;  Li Shize;  Tang Yiping 收藏  |  浏览/下载：3/0  |  提交时间：2019/12/03 defocusing digital particle image velocimetry  micro/nanolithography  resist filling behavior   Investigation of resist filling behavior in microimprint lithography by computational fluid dynamics simulation and defocusing digital particle image velocimetry 期刊论文 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2013, 卷号: 31, 期号: [db:dc_citation_issue] 作者:  Du, Jun;  Wei, Zhengying;  Li, Shize;  Tang, Yiping 收藏  |  浏览/下载：2/0  |  提交时间：2019/12/03 Visualization experimental research on resist three-dimensional microflow fields in microlithography 期刊论文 Zhejiang Daxue Xuebao (Gongxue Ban)/Journal of Zhejiang University (Engineering Science), 2013, 卷号: 47, 期号: [db:dc_citation_issue], 页码: 1871-1876 作者:  Du, Jun;  Wei, Zheng-Ying;  He, Wei;  Geng, Qi 收藏  |  浏览/下载：3/0  |  提交时间：2019/12/03 Defocusing digital particle image velocimetry  Experimental research  Filling behavior  Micro/nanolithography  Resist  Three-dimensional particle tracking velocimetry (3D- PTV)  Three-dimensional velocity fields  Threedimensional (3-d)   Resist filling behavior in microimprint 期刊论文 Hsi-An Chiao Tung Ta Hsueh/Journal of Xi'an Jiaotong University, 2013, 卷号: 47, 期号: [db:dc_citation_issue], 页码: 126-133 作者:  Li, Shize;  Wei, Zhengying;  Du, Jun;  Tang, Yiping 收藏  |  浏览/下载：9/0  |  提交时间：2019/12/10 Defocusing digital particle image velocimetry  Evolution direction  Experimental errors  Microimprint  Motion trajectories  Particle tracking velocimetry  Visualization experiment  Visualization research   Experimental research on resist filling behavior in microimprint lithography by using defocusing digital particle image velocimetry 期刊论文 MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2013, 卷号: 19, 期号: [db:dc_citation_issue], 页码: 1229-1238 作者:  Du Jun;  Wei Zhengying;  Li Shize;  Tang Yiping 收藏  |  浏览/下载：5/0  |  提交时间：2019/12/10 Numerical Simulation and Experimental Study on Resist Filling Behavior in UV-nanoimprint Lithography 会议论文 作者:  Du, J.;  Wei, Z.;  Tang, Y. 收藏  |  浏览/下载：4/0  |  提交时间：2019/12/10 Defocusing digital particle image velocimetry  Filling behavior  NIL   Effects of Mold Geometries and Initial Resist Thickness on Filling Behavior in UV-Nanoimprint Lithography 期刊论文 JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE, 2012, 卷号: 9, 期号: [db:dc_citation_issue], 页码: 1029-1035 作者:  Du, Jun;  Wei, Zhengying;  He, Wei;  Tang, Yiping 收藏  |  浏览/下载：3/0  |  提交时间：2019/12/10 Filling Mode  Nanoimprint Lithography  Initial Resist Thickness  Filling Behavior  Duty Ratio   Flow behavior of resist in room-temperature micro-imprinting and its process optimization 期刊论文 Guangxue Jingmi Gongcheng/Optics and Precision Engineering, 2010, 卷号: 18, 期号: [db:dc_citation_issue], 页码: 1822-1832 作者:  Wei, Zheng-Ying;  Xiong, Xiao-Dong;  Du, Jun;  Ding, Yu-Cheng 收藏  |  浏览/下载：2/0  |  提交时间：2019/12/10 Duty ratios  Filling rate  Fluid solid interaction  Imprinting process  Residual thickness  Room-temperature micro-imprinting  Technological conditions  Visual experiments