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Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography 期刊论文
journal of materials chemistry, 2012, 卷号: 22, 期号: 42, 页码: 22678-22685
Geng C (Geng, Chong); Zheng L (Zheng, Lu); Yu J (Yu, Jie); Yan QF (Yan, Qingfeng); Wei TB (Wei, Tongbo); Wang XQ (Wang, Xiaoqing); Shen DZ (Shen, Dezhong)
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