已选(0)清除
条数/页: 排序方式:
|
| Necessity of resist model in source mask optimization for negative tone development process 期刊论文 J. Micro/Nanolith. MEMS MOEMS, 2017 作者: Wei YY(韦亚一) ; Dong LS(董立松) ; Zhao LJ(赵利俊) ; Chen WH(陈文辉); Ye TC(叶甜春)![](/image/person.jpg)
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:13/0  |  提交时间:2018/06/08 |
| Mitigating the influence of wafer topography on the implantation process in optical lithography 期刊论文 Optics Letter, 2017 作者: Su XJ(苏晓菁) ; Dong LS(董立松) ; Chen WH(陈文辉); Fan TA(范泰安) ; Wei YY(韦亚一)![](/image/person.jpg)
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:18/0  |  提交时间:2018/06/08 |
| New alignment mark designs in single patterning and self-aligned double patterning 期刊论文 Microelectronic Engineering, 2017 作者: Zhang LB(张利斌) ; Dong LS(董立松) ; Su XJ(苏晓菁) ; Wei YY(韦亚一) ; Ye TC(叶甜春)![](/image/person.jpg)
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:11/0  |  提交时间:2018/07/09 |
| New alignment mark design structures for higher diffraction order wafer quality enhancement 会议论文 作者: Wei YY(韦亚一) ; Zhang LB(张利斌) ; Dong LS(董立松) ; Su XJ(苏晓菁) ; Ye TC(叶甜春)![](/image/person.jpg)
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:8/0  |  提交时间:2018/07/26 |
| Observation of Lambda(+)(c) -> nK(S)(0)pi(+) 期刊论文 PHYSICAL REVIEW LETTERS, 2017, 卷号: 118, 期号: 1-11 作者: Ablikim, M; Achasov, MN; Ahmed, S; Ai, XC; Albayrak, O
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:170/0  |  提交时间:2017/05/09 |
| Evidence of Two Resonant Structures in e(+)e(-)->pi(+) pi(-) h(c) 期刊论文 PHYSICAL REVIEW LETTERS, 2017, 卷号: 118, 期号: 1-9 作者: Ablikim, M; Achasov, MN; Ahmed, S; Ai, XC; Albayrak, O
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:150/0  |  提交时间:2017/05/09 |
| Precise Measurement of the e(+)e(-) ->pi(+)pi(-) J/psi Cross Section at Center-of-Mass Energies from 3.77 to 4.60 GeV 期刊论文 PHYSICAL REVIEW LETTERS, 2017, 卷号: 118, 期号: 1-9 作者: Ablikim, M; Achasov, MN; Ahmed, S; Ai, XC; Albayrak, O
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:159/0  |  提交时间:2017/05/09 |
| Hotspots fixing flow in NTD process by using DTCO methodology at 10nm metal 1 layer 会议论文 作者: Wei YY(韦亚一) ; Ye TC(叶甜春) ; Chen Y(陈颖); Lin JX(林佳欣); Dong LS(董立松)![](/image/person.jpg)
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:18/0  |  提交时间:2018/07/26 |
| Enhancing manufacturability of standard cells by using DTCO methodology 会议论文 作者: Su XJ(苏晓菁) ; Chen Y(陈颖); Zhao LJ(赵利俊) ; Su YJ(粟雅娟) ; Wei YY(韦亚一)![](/image/person.jpg)
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:9/0  |  提交时间:2018/07/26 |
| Amplitude analysis of the chi(c1) -> eta pi(+)pi(-) decays 期刊论文 PHYSICAL REVIEW D, 2017, 卷号: 95, 期号: 1-3 作者: Ablikim, M; Achasov, MN; Ahmed, S; Ai, XC; Albayrak, O
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:131/0  |  提交时间:2017/05/09 |