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Temperature- and voltage-dependent trap generation model in high-k metal gate MOS device with percolation simulation 期刊论文
Chinese Physics B, 2016
作者:  Xu H(徐昊);  Yang H(杨红);  Wang YR(王艳蓉);  Luo WC(罗维春);  Qi LW(祁路伟)
收藏  |  浏览/下载:17/0  |  提交时间:2017/05/09
Accurate lifetime prediction for channel hot carrier stress on sub-1 nm equivalent oxide thickness HK/MG nMOSFET with thin titanium nitride capping layer 期刊论文
Microelectronics Reliability, 2016
作者:  Luo WC(罗维春);  Yang H(杨红);  Wang WW(王文武);  Zhu HL(朱慧珑);  Zhao C(赵超)
收藏  |  浏览/下载:14/0  |  提交时间:2017/05/09


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