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浏览/检索结果: 共12条，第1-10条 帮助 限定条件 发表日期：2014     已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 FLDA: Latent Dirichlet Allocation Based Unsteady Flow Analysis 期刊论文 ieee可视化与计算机图示学汇刊, 2014 Hong, Fan; Lai, Chufan; Guo, Hanqi; Shen, Enya; Yuan, Xiaoru; Li, Sikun 收藏  |  浏览/下载：3/0  |  提交时间：2015/11/10 Flow visualization  Topic model  Latent Dirichlet allocation (LDA)  INTERACTIVE EXPLORATION  MULTIVARIATE DATA  SEMANTIC ANALYSIS  VOLUME DATA  DATA SETS  VISUALIZATION  FRAMEWORK  FEATURES   Efficient source mask optimization using multipole source representation 期刊论文 j. micro-nanolithogr. mems moems, 2014, 卷号: 13, 期号: 4, 页码: 43001 作者:  Yang, Chaoxing;  Li, Sikun;  Wang, Xiangzhao 收藏  |  浏览/下载：13/0  |  提交时间：2016/11/28 source mask optimization  genetic algorithm  source representation  pupil filling ratio   Aberration measurement based on principal component analysis of aerial images of optimized marks 期刊论文 opt. commun., 2014, 卷号: 329, 页码: 63 作者:  Yan, Guanyong;  Wang, Xiangzhao;  Li, Sikun;  Yang, Jishuo;  Xu, Dongbo 收藏  |  浏览/下载：17/0  |  提交时间：2016/11/28 Aberration measurement  Principal component analysis  Optimized marks  Aerial image   Efficient source mask optimization using multipole source representation 期刊论文 j. micro-nanolithogr. mems moems, 2014, 卷号: 13, 期号: 4, 页码: 43001 作者:  Yang, Chaoxing;  Li, Sikun;  Wang, Xiangzhao 收藏  |  浏览/下载：14/0  |  提交时间：2016/11/28 source mask optimization  genetic algorithm  source representation  pupil filling ratio   Aberration measurement technique based on an analytical linear model of a through-focus aerial image 期刊论文 opt. express, 2014, 卷号: 22, 期号: 5, 页码: 5623 作者:  Yan, Guanyong;  Wang, Xiangzhao;  Li, Sikun;  Yang, Jishuo;  Xu, Dongbo 收藏  |  浏览/下载：25/0  |  提交时间：2016/11/28 NIJBOER-ZERNIKE APPROACH  POINT-SPREAD FUNCTIONS  PHASE-SHIFTING MASK  LITHOGRAPHIC TOOLS  PROJECTION OPTICS  COMA MEASUREMENT  ILLUMINATION  COMPUTATION   Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography 会议论文 conference on extreme ultraviolet (euv) lithography v 作者:  Liu, Xiaolei;  Wang, Xiangzhao;  Li, Sikun;  Yan, Guanyong;  Erdmann, Andreas 收藏  |  浏览/下载：11/0  |  提交时间：2016/11/28 In situ aberration measurement method using a phase-shift ring mask 会议论文 27th optical microlithography conference as part of the spie advanced lithography symposium 作者:  Wang, Xiangzhao;  Li, Sikun;  Yang, Jishuo;  Tang, Feng;  Yan, Guanyong 收藏  |  浏览/下载：10/0  |  提交时间：2016/11/28 Aberration measurement based on principal component analysis of aerial images of optimized marks 期刊论文 opt. commun., 2014, 卷号: 329, 页码: 63 作者:  Yan, Guanyong;  Wang, Xiangzhao;  Li, Sikun;  Yang, Jishuo;  Xu, Dongbo 收藏  |  浏览/下载：18/0  |  提交时间：2016/11/28 Aberration measurement  Principal component analysis  Optimized marks  Aerial image   A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask 会议论文 27th optical microlithography conference as part of the spie advanced lithography symposium 作者:  Li, Sikun;  Wang, Xiangzhao;  Yang, Jishuo;  Tang, Feng;  Yan, Guanyong 收藏  |  浏览/下载：17/0  |  提交时间：2016/11/28 Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography 期刊论文 j. micro-nanolithogr. mems moems, 2014, 卷号: 13, 期号: 3, 页码: 33007 作者:  Liu, Xiaolei;  Wang, Xiangzhao;  Li, Sikun;  Yan, Guanyong;  Erdmann, Andreas 收藏  |  浏览/下载：17/0  |  提交时间：2016/11/28 extreme ultraviolet lithography  mask model  shadowing effect  pattern shift  critical dimension bias