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长春光学精密机械与物... [6]
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期刊论文 [5]
会议论文 [1]
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2021 [1]
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专题:长春光学精密机械与物理研究所
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Broadband Anti-Reflection Coatings Fabricated by Precise Time-Controlled and Oblique-Angle Deposition Methods
期刊论文
Coatings, 2021, 卷号: 11, 期号: 5, 页码: 10
作者:
X. Guo
;
X. Q. Quan
;
Z. Z. Li
;
Q. Li
;
B. Z. Zhang
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  |  
浏览/下载:5/0
  |  
提交时间:2022/06/13
Hybrid Nanostructured Antireflection Coating by Self-Assembled Nanosphere Lithography
期刊论文
Coatings, 2019, 卷号: 9, 期号: 7, 页码: 10
作者:
Z.Z.Li
;
C.Song
;
Q.Li
;
X.J.Xiang
;
H.G.Yang
收藏
  |  
浏览/下载:1/0
  |  
提交时间:2020/08/24
antireflection coating,multilayer thin-film,nanostructure,self-assembling,broad-band,solar-cells,conversion efficiency,enhancement
Topology optimization design for main frame of infrared seeker's stabilization platform
期刊论文
Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering, 2016, 卷号: 45, 期号: 2
作者:
Liu, Z.
;
T. Zhang
;
P. Wang and T. Wang
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  |  
浏览/下载:13/0
  |  
提交时间:2017/09/11
A model for multilayer analysis in a coated extreme ultra-violet lithography projection system
期刊论文
Optics Communications, 2014, 期号: 332, 页码: 339-342
Wang J.
;
Jin C. S.
;
Wang L. P.
;
Xie Y.
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  |  
浏览/下载:12/0
  |  
提交时间:2015/04/24
2-nm narrow band pass filter in standard configuration evaporate coating machine
期刊论文
Chinese Optics Letters, 2013, 卷号: 11, 期号: SUPPL.1, 页码: S10208-1-S10208-2
Li J.
;
Goetzelmann R.
;
Wang X.
;
Wu J.
;
Xiao C.
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  |  
浏览/下载:7/0
  |  
提交时间:2014/05/14
Automatic spin coater for concave spherical substrate (EI CONFERENCE)
会议论文
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China
Fengchao L.
;
Jingsong G.
;
Xiaoguo F.
;
Jingli Z.
;
Zhijun X.
;
Jun H.
;
Fenglin X.
;
Huiqing W.
;
Xiaohan L.
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  |  
浏览/下载:18/0
  |  
提交时间:2013/03/25
Coating photoresist film with uniform thickness on concave spherical substrate (CSS) is very important for microfabrication of concave spherical optical elements by lithography technique via a laser direct writer
for the uneven photoresist film will result in ununiformity of line width so as to influence the characters of optical elements. For improving the uniformity of photoresist film coating on CSS
an automatic spin coater was designed. The process and the mathematical model of spin coating for CSS were analyzed. Difficulties for realizing the spin coater consist of the control of multi-axis motion precisely and collaboratively
valves on/ff properly and real-timely. A flexible and well-behaved spinning motion system was achieved by tmeans of principal and subordinate CPUs control. The motion program for spin coating could be created and implemented automatically while the pressure and the valves were was watched and controlled in real time. Film coating and laser direct writing experiments on a CSS with aperture equals to 100 mm and radius equals to 370 mm were performed. Photoresist film with uniform thickness on CSS was obtained by selecting proper spin coating parameters such as rotational speed
acceleration and viscosity of the photoresist. After development
the section analysis by the atomic force microscope showed that photoresist film thickness was about 517 nm in the center and about 520 nm in the edge of substrate
the film thickness error was within 1%
and the line width was about 6.0 m with steep sides parallel each other. Experimental results indicate that uniform thickness of thin photoresist film has been coated on CSS by the spin coater
which contributes to quality improvement of laser direct writing lines on CSS.
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