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Removal of boron from polycrystalline silicon via partial evaporation, by partially melting polycrystalline silicon with electron beam, evaporating melted silicon, and collecting accumulated polycrystalline silicon. 专利
申请日期: 2010-01-01, 公开日期: 2010-05-19
作者:  DONG W JIANG D LI G TAN Y
收藏  |  浏览/下载:6/0  |  提交时间:2019/12/24
Semiconductor laser and manufacture thereof 专利
专利号: JP1991236293A, 申请日期: 1991-10-22, 公开日期: 1991-10-22
作者:  NAGAI YUTAKA
收藏  |  浏览/下载:38/0  |  提交时间:2020/01/18


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