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The influence of channel length on total ionizing dose effect in deep submicron technologies 期刊论文
ACTA PHYSICA SINICA, 2012, 卷号: 61, 期号: 5, 页码: 50702
Hu, ZY; Liu, ZL; Shao, H; Zhang, ZX; Ning, BX; Bi, DW; Chen, M; Zou, SC
收藏  |  浏览/下载:19/0  |  提交时间:2013/04/17
Fabrication of Direct Silicon Bonded Hybrid Orientation Substrate by Separation by Implanted Oxygen Layer Transfer and Oxide Dissolution Annealing 期刊论文
APPLIED PHYSICS EXPRESS, 2011, 卷号: 4, 期号: 3, 页码: 31301
Wei,X; Xue,ZY; Wu,AM; Cao,GB; Zhang,B; Lin,CL; Zhang,MA; Wang,X
收藏  |  浏览/下载:42/0  |  提交时间:2012/04/10
Origin of high oxide to nitride polishing selectivity of ceria-based slurry in the presence of picolinic acid 期刊论文
CHINESE PHYSICS B, 2011, 卷号: 20, 期号: 3, 页码: 38102
Wang,LY; Liu,B; Song,ZT; Liu,WL; Feng,SL; Huang,D; Babu,SV
收藏  |  浏览/下载:13/0  |  提交时间:2012/04/10
Fabrication of Direct Silicon Bonded Hybrid Orientation Substrate by Separation by Implanted Oxygen Layer Transfer and Oxide Dissolution Annealing 期刊论文
APPLIED PHYSICS EXPRESS, 2011, 卷号: 4, 期号: 3, 页码: 31301
Wei, X; Xue, ZY; Wu, AM(重点实验室); Cao, GB; Zhang, B; Lin, CL(重点实验室); Zhang, MA; Wang, X(重点实验室)
收藏  |  浏览/下载:12/0  |  提交时间:2013/05/10
Proximity and reversal magnetoresistance behaviour in the oxide heterostructure of cuprate and manganite 期刊论文
SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 2010, 卷号: 23, 期号: 3, 页码: 34010
Cai, CB; Peng, L; Holzapfel, B; Xie, XM(重点实验室); Liu, ZY; Lu, YM; Chen, CZ
收藏  |  浏览/下载:5/0  |  提交时间:2013/05/10
Forming-free colossal resistive switching effect in rare-earth-oxide Gd2O3 films for memristor applications 期刊论文
JOURNAL OF APPLIED PHYSICS, 2009, 卷号: 106, 期号: 7, 页码: 73723
Cao, X; Li, XM; Gao, XD; Yu, WD; Liu, XJ; Zhang, YW; Chen, LD; Cheng, XH(重点实验室)
收藏  |  浏览/下载:10/0  |  提交时间:2013/05/10
Forming-free colossal resistive switching effect in rare-earth-oxide Gd2O3 films for memristor applications 期刊论文
JOURNAL OF APPLIED PHYSICS, 2009, 卷号: 106, 期号: 7, 页码: 73723-73723
Cao,X; Li,XM; Gao,XD; Yu,WD; Liu,XJ; Zhang,YW; Chen,LD; Cheng,XH
收藏  |  浏览/下载:12/0  |  提交时间:2012/03/24
Effects of the technology of implanting nitrogen into buried oxide layer on the characteristics of partially depleted SOI nMOSFET 期刊论文
ACTA PHYSICA SINICA, 2005, 卷号: 54, 期号: 1, 页码: 348-353
Zheng, ZS; Liu, ZL; Zhang, GQ; Li, N; Fan, K; Zhang, EX; Yi, WB; Chen, M; Wang, X
收藏  |  浏览/下载:13/0  |  提交时间:2012/03/24


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