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浏览/检索结果: 共6条，第1-6条 帮助 限定条件 学科主题：半导体材料    内容类型：会议论文     已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 Microstructural and compositional characteristics of GaN films grown on a ZnO-buffered Si(111) wafer 会议论文 international wuhan symposium on advanced electron microscopy (iwsaem), wuhan, peoples r china, oct 17-21, 2003 Luo XH; Wang RM; Zhang XP; Zhang HZ; Yu DP; Luo MC 收藏  |  浏览/下载：18/1  |  提交时间：2010/10/29 transmission electron microscopy  electron energy loss spectroscopy  molecular beam epitaxy  gallium nitride  CHEMICAL-VAPOR-DEPOSITION  EPITAXY  LAYER   In situ doping of 3C-SiC grown on (0001) sapphire substrates by LPCVD 会议论文 international conference on silicon carbide and related materials, tsukuba, japan, oct 28-nov 02, 2001 Sun GS; Luo MC; Wang L; Zhu SR; Li JM; Zeng YP; Lin LY 收藏  |  浏览/下载：13/0  |  提交时间：2010/11/15 3C-SiC  in-situ doping  low-pressure CVD  sapphire substrate  CHEMICAL-VAPOR-DEPOSITION  COMPETITION EPITAXY   Structural evaluation of polycrystalline silicon thin films by hot-wire-assisted PECVD 会议论文 1st international conference on cat-cvd (hot wire cvd) process, kanazawa, japan, nov 14-17, 2000 Feng Y; Zhu M; Liu F; Liu J; Han H; Han Y 收藏  |  浏览/下载：20/0  |  提交时间：2010/11/15 poly-Si  structure  hot-wire  plasma-enhanced chemical vapor deposition (PECVD)  CHEMICAL-VAPOR-DEPOSITION  MICROCRYSTALLINE SILICON  HYDROGEN   In situ annealing treatment and In-doping of GaN epilayers grown by MOVPE 会议论文 10th international conference on metalorganic vapor phase epitaxy (icmovpe-x), sapporo, japan, jun 05-09, 2000 Lu DC; Wang CX; Yuan HR; Liu XL; Wang XH 收藏  |  浏览/下载：9/0  |  提交时间：2010/11/15 GaN  annealing treatment  In-doping  MOVPE  photoluminescence  CHEMICAL-VAPOR-DEPOSITION  PHASE EPITAXY  BUFFER LAYER  FILMS  SAPPHIRE   Raman study on residual strains in thin 3C-SiC epitaxial layers grown on Si(001) 会议论文 1st asian conference on chemical vapour deposition, shanghai, peoples r china, may 10-13, 1999 Zhu JJ; Liu SY; Liang JW 收藏  |  浏览/下载：3/0  |  提交时间：2010/11/15 Raman spectrum  thin film  chemical vapor deposition  SCATTERING  SI   MOCVD growth of cubic GaN: Materials and devices 会议论文 international workshop on nitride semiconductors (iwn 2000), nagoya, japan, sep 24-27, 2000 作者:  Zhao DG;  Zhang SM 收藏  |  浏览/下载：17/0  |  提交时间：2010/10/29 MOCVD  GaN  InGaN  cubic  LED  CHEMICAL-VAPOR-DEPOSITION  MOLECULAR-BEAM EPITAXY  GALLIUM NITRIDE  PHASE EPITAXY  INGAN FILMS  ELECTROLUMINESCENCE  ZINCBLENDE  WURTZITE  MBE