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浏览/检索结果: 共4条，第1-4条 帮助 限定条件 发表日期：2020     已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 Performance and local structure evolution of NbMoTaWV entropy-stabilized oxide thin films with variable oxygen content 期刊论文 Surface and Coatings Technology, 2020, 卷号: 402 作者:  Bi, Linxia;  Li, Xiaona;  Li, Zhumin;  Hu, Yinglin;  Zhang, Junyi 收藏  |  浏览/下载：20/0  |  提交时间：2020/11/14 Crystal atomic structure  Entropy  Film preparation  Hardness  Magnetic semiconductors  Magnetron sputtering  Molybdenum alloys  Niobium alloys  Oxide minerals  Oxide semiconductors  Oxygen  Refractory metals  Silicon wafers  Single crystals  Tantalum alloys  Thin films  Titanium dioxide  Tungsten alloys  Vanadium alloys  Amorphous oxide semiconductor (AOS)  Application prospect  Conductive mechanisms  Metal oxide thin films  Radio frequency magnetron sputtering  Room-temperature resistivity  Temperature behavior  Wide temperature ranges   Performance and local structure evolution of NbMoTaWV entropy-stabilized oxide thin films with variable oxygen content 期刊论文 Surface and Coatings Technology, 2020, 卷号: 402 作者:  Bi, Linxia;  Li, Xiaona;  Li, Zhumin;  Hu, Yinglin;  Zhang, Junyi 收藏  |  浏览/下载：19/0  |  提交时间：2022/02/17 Crystal atomic structure  Entropy  Film preparation  Hardness  Magnetic semiconductors  Magnetron sputtering  Molybdenum alloys  Niobium alloys  Oxide minerals  Oxide semiconductors  Oxygen  Refractory metals  Silicon wafers  Single crystals  Tantalum alloys  Thin films  Titanium dioxide  Tungsten alloys  Vanadium alloys  Amorphous oxide semiconductor (AOS)  Application prospect  Conductive mechanisms  Metal oxide thin films  Radio frequency magnetron sputtering  Room-temperature resistivity  Temperature behavior  Wide temperature ranges   The effect of Y2O3 addition on He desorption behavior and He bubble evolution in He-charged W-Y2O3 film 期刊论文 THIN SOLID FILMS, 2020, 卷号: 709 作者:  Wang, Le;  Hao, Ting;  Zhao, Bang-Lei;  Liu, Rui;  Fang, Qian-Feng 收藏  |  浏览/下载：41/0  |  提交时间：2020/10/26 He bubbles  Helium-charged tungsten film  Thermal desorption  Thin film  Magnetron sputtering  Yttrium oxide   Direct Regulation of O/W Stoichiometric Ratio and Microstructure in Tungsten Oxide Electrochromic Films by Ar Pressure Using Oxide Target Sputtering 期刊论文 PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2020, 卷号: 217, 期号: 8 作者:  Zhao, Wenkai;  Zhao, Yue;  Yang, Ye;  Li, Jia;  Lan, Pinjun 收藏  |  浏览/下载：11/0  |  提交时间：2020/12/16 THIN-FILMS  PERFORMANCE  DEGRADATION  DEPOSITION  DYNAMICS  DEVICE