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Direct Regulation of O/W Stoichiometric Ratio and Microstructure in Tungsten Oxide Electrochromic Films by Ar Pressure Using Oxide Target Sputtering 期刊论文
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2020, 卷号: 217, 期号: 8
作者:  Zhao, Wenkai;  Zhao, Yue;  Yang, Ye;  Li, Jia;  Lan, Pinjun
收藏  |  浏览/下载:11/0  |  提交时间:2020/12/16


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