Adjustment Strategy for Inclination Moire Fringes in Lithography by Spatial Frequency Decomposition

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 光电技术研究所被WoS收录文章

	Adjustment Strategy for Inclination Moire Fringes in Lithography by Spatial Frequency Decomposition
	Zhu, Jiangping 1; Hu, Song 2; Su, Xianyu 1; You, Zhisheng 1
刊名	IEEE PHOTONICS TECHNOLOGY LETTERS
	2015-02-15
卷号	27 期号:4
关键词	Proximity lithography mask-wafer alignment phase analysis spatial frequency
英文摘要	The recently proposed four-quadrant grating Moire fringe alignment scheme was demonstrated to have the potential of achieving nanometer alignment for proximity lithography. The mask-wafer misalignment was accurately detected by comparing the phase between two sets of Moire fringes averaged along with the fringe direction, making the inclination adjustment of Moire fringes highly imperative. The inclination closely related with the included angle between mask (alignment mark) and wafer (alignment mark) largely influences the alignment accuracy. To solve this issue, we present an adjustment strategy based on the spatial frequency decomposition of two sets of differential Moire fringes, by which the included angle can be accurately adjusted with an accuracy of better than 10-5 rad. The subsequent discussion indicates that the position of imaging system can be responsible for the inclination but actually it would not affect the mask-wafer alignment, so that our proposed adjustment strategy can be operated simply and feasibly, which is validated by the theoretical analysis and experimental results.
WOS标题词	Science & Technology ; Technology ; Physical Sciences
类目[WOS]	Engineering, Electrical & Electronic ; Optics ; Physics, Applied
研究领域[WOS]	Engineering ; Optics ; Physics
关键词[WOS]	PROXIMITY LITHOGRAPHY ; IMAGING METHOD ; ANGLE ; DISPLACEMENT ; GRATINGS
收录类别	SCI
语种	英语
WOS记录号	WOS:000349111700002
公开日期	2015-12-24
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/2524]
专题	光电技术研究所_光电技术研究所被WoS收录文章
作者单位	1.Sichuan Univ, Sch Comp Sci & Technol, Chengdu 610064, Peoples R China 2.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
推荐引用方式 GB/T 7714	Zhu, Jiangping,Hu, Song,Su, Xianyu,et al. Adjustment Strategy for Inclination Moire Fringes in Lithography by Spatial Frequency Decomposition[J]. IEEE PHOTONICS TECHNOLOGY LETTERS,2015,27(4).
APA	Zhu, Jiangping,Hu, Song,Su, Xianyu,&You, Zhisheng.(2015).Adjustment Strategy for Inclination Moire Fringes in Lithography by Spatial Frequency Decomposition.IEEE PHOTONICS TECHNOLOGY LETTERS,27(4).
MLA	Zhu, Jiangping,et al."Adjustment Strategy for Inclination Moire Fringes in Lithography by Spatial Frequency Decomposition".IEEE PHOTONICS TECHNOLOGY LETTERS 27.4(2015).