Preparation and characterization of high-quality TiN films at low temperature by filtered cathode arc plasma

	Preparation and characterization of high-quality TiN films at low temperature by filtered cathode arc plasma
	Zhang, YJ ; Yan, PX ; Wu, ZG ; Xu, JW ; Zhang, WW ; Li, X ; Liu, WM ; Xue, QJ
刊名	journal of vacuum science & technology a
	2004-11-01
卷号	22 期号:6 页码:2419-2423
英文摘要	high-quality tin films were successfully deposited on silicon and stainless-steel substrates at low temperature using an improved filtered cathode arc plasma technique developed in our lab. atomic force microscope, x-ray diffractometer, x-ray photoelectron spectroscopy, and a nanoindenter were employed to characterize the tin thin films. the microhardness of the tin films have a high value up to 41 gpa. which is far higher than that of tin compounds deposited by conventional chemical vapor deposition and physical vapor deposition methods (20 gpa or so). the films are of a stronger preferred crystalline orientation, very smooth surface, and high reflectivity. the effects of the negative substrate bias on the preferred crystalline orientation, surface roughness, deposition rate, and microhardness of tin thin films are discussed in detail. (c) 2004 american vacuum society.
WOS标题词	science & technology ; technology ; physical sciences
类目[WOS]	materials science, coatings & films ; physics, applied
研究领域[WOS]	materials science ; physics
关键词[WOS]	thin-films ; evaporation ; deposition
收录类别	SCI
语种	英语
WOS记录号	WOS:000225505900035
公开日期	2015-11-10
内容类型	期刊论文
源URL	[http://159.226.238.44/handle/321008/139345]
专题	大连化学物理研究所_中国科学院大连化学物理研究所
作者单位	1.Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China 2.Chinese Acad Sci, Inst Chem Phys, State Key Lab Solia Lubricat, Lanzhou 730000, Peoples R China
推荐引用方式 GB/T 7714	Zhang, YJ,Yan, PX,Wu, ZG,et al. Preparation and characterization of high-quality TiN films at low temperature by filtered cathode arc plasma[J]. journal of vacuum science & technology a,2004,22(6):2419-2423.
APA	Zhang, YJ.,Yan, PX.,Wu, ZG.,Xu, JW.,Zhang, WW.,...&Xue, QJ.(2004).Preparation and characterization of high-quality TiN films at low temperature by filtered cathode arc plasma.journal of vacuum science & technology a,22(6),2419-2423.
MLA	Zhang, YJ,et al."Preparation and characterization of high-quality TiN films at low temperature by filtered cathode arc plasma".journal of vacuum science & technology a 22.6(2004):2419-2423.