Mechanisms in fs-laser ablation in fused silica | |
Jia TQ(贾天卿) ; Xu ZZ(徐至展) ; Li RX(李儒新) ; Feng DH(冯东海) ; Li XX ; Cheng CF ; Sun HY ; Xu NS ; Wang HZ | |
刊名 | j. appl. phys.
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2004 | |
卷号 | 95期号:9页码:5166 |
关键词 | FEMTOSECOND OPTICAL-BREAKDOWN SUBPICOSECOND PULSES PHOTON-ABSORPTION IMPACT IONIZATION CONDUCTION-BAND INDUCED DAMAGE DIELECTRICS SIO2 RELAXATION NANOSECOND |
ISSN号 | 0021-8979 |
中文摘要 | a theoretical model is proposed to describe the microscopic processes involved in the ablation in fused silica induced by femtosecond-laser pulse. conduction-band electron (cbe) can absorb laser energy, the rate is calculated by quantum mechanical method and classical method. cbe is produced via photoionization (pi) and impact ionization (ii). the pi and ii rates are calculated by using the keldysh theory and double-flux model, respectively. besides the cbe production, we investigate laser energy deposition and its distribution. the equation of energy diffusion in physical space is resolved numerically. taking energy density e-dep=54 kj/cm(3) as the criterion, we calculate damage threshold, ablation depth, and ablation volumes. it is found that if energy diffusion is considered, energy density near sample surface is reduced to 1/10, damage threshold is enhanced more than 30%, ablation depth is increased by a factor of 10. our theoretical results agree well with experimental measurements. several ultrafast phenomena in fused silica are also discussed. (c) 2004 american institute of physics. |
语种 | 英语 |
WOS记录号 | WOS:000220875400099 |
公开日期 | 2009-09-18 |
内容类型 | 期刊论文 |
源URL | [http://ir.siom.ac.cn/handle/181231/112] ![]() |
专题 | 上海光学精密机械研究所_强场激光物理国家重点实验室 |
推荐引用方式 GB/T 7714 | Jia TQ,Xu ZZ,Li RX,et al. Mechanisms in fs-laser ablation in fused silica[J]. j. appl. phys.,2004,95(9):5166, 5171. |
APA | 贾天卿.,徐至展.,李儒新.,冯东海.,Li XX.,...&Wang HZ.(2004).Mechanisms in fs-laser ablation in fused silica.j. appl. phys.,95(9),5166. |
MLA | 贾天卿,et al."Mechanisms in fs-laser ablation in fused silica".j. appl. phys. 95.9(2004):5166. |
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