A large-area 15 nm graphene nanoribbon array patterned by a focused ion beam

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	A large-area 15 nm graphene nanoribbon array patterned by a focused ion beam
	Zhang, Y ; Hui, C ; Sun, RJ ; Li, K ; He, K ; Ma, XC ; Liu, F
刊名	NANOTECHNOLOGY
	2014
卷号	25 期号:13
关键词	graphene nanoribbon focused ion beam photodetector epitaxial graphene Monte Carlo
ISSN号	0957-4484
通讯作者	Zhang, Y (reprint author), Univ Utah, Dept Mat Sci & Engn, Salt Lake City, UT 84112 USA.
中文摘要	Using a focused ion beam, we patterned epitaxial graphene on SiC into an array of graphene nanoribbons as narrow as 15 nm by optimizing the Ga+ ion beam current, acceleration voltage, dwell time, beam center-to-center distance and ion dose. The ion dose required to completely etch away graphene on SiC was determined and compared with the Monte Carlo simulation result. In addition, a photodetector using an array of 300 20 nm graphene nanoribbons was fabricated and its photoresponse was studied.
资助信息	Solan, LLC.; DOE [DEFG02-04ER46148]
语种	英语
公开日期	2015-04-14
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/59371]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Zhang, Y,Hui, C,Sun, RJ,et al. A large-area 15 nm graphene nanoribbon array patterned by a focused ion beam[J]. NANOTECHNOLOGY,2014,25(13).
APA	Zhang, Y.,Hui, C.,Sun, RJ.,Li, K.,He, K.,...&Liu, F.(2014).A large-area 15 nm graphene nanoribbon array patterned by a focused ion beam.NANOTECHNOLOGY,25(13).
MLA	Zhang, Y,et al."A large-area 15 nm graphene nanoribbon array patterned by a focused ion beam".NANOTECHNOLOGY 25.13(2014).