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Engineering Double-Walled Carbon Nanotubes by Ar Plasma
Zhang, YC ; Yan, J ; Zhao, SQ ; Wang, WL ; Liang, WJ
刊名CHINESE PHYSICS LETTERS
2014
卷号31期号:8
ISSN号0256-307X
通讯作者Liang, WJ (reprint author), Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China.
中文摘要Double-walled carbon nanotubes (DWCNTs) have been found to be promising nano-materials for nano-mechanical and nano-electrical devices due to their double-walled structures. Modifying DWCNTs would be one of the key technologies for device construction. We demonstrate engineering the geometry of DWCNTs by etching with Ar plasma. The characterization by atomic force microscopy indicates that single atomic carbon layers could be removed from DWCNTs by Ar plasma. The etching effect is further investigated by electrical measurements on DWCNT field-effect transistors, which allow us to study the interwall screen effect as well.
资助信息100 Talents Program of Chinese Academy of Sciences [KJCX2-YW-W35]; National Natural Science Foundation of China [11374342]
语种英语
公开日期2015-04-14
内容类型期刊论文
源URL[http://ir.iphy.ac.cn/handle/311004/59026]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Zhang, YC,Yan, J,Zhao, SQ,et al. Engineering Double-Walled Carbon Nanotubes by Ar Plasma[J]. CHINESE PHYSICS LETTERS,2014,31(8).
APA Zhang, YC,Yan, J,Zhao, SQ,Wang, WL,&Liang, WJ.(2014).Engineering Double-Walled Carbon Nanotubes by Ar Plasma.CHINESE PHYSICS LETTERS,31(8).
MLA Zhang, YC,et al."Engineering Double-Walled Carbon Nanotubes by Ar Plasma".CHINESE PHYSICS LETTERS 31.8(2014).
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